Photophysical, photostability, and ROS generation properties of new trifluoromethylated quinoline-phenol Schiff bases

Inaiá O. Rocha, Yuri G. Kappenberg, Wilian C. Rosa, Clarissa P. Frizzo, Nilo Zanatta, Marcos A. P. Martins, Isadora Tisoco, Bernardo A. Iglesias and Helio G. Bonacorso
Beilstein J. Org. Chem. 2021, 17, 2799–2811. https://doi.org/10.3762/bjoc.17.191

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Supporting Information File 1: NMR spectra of the compounds, IR spectra, crystallographic data, photophysical and singlet oxygen spectra of new structures.
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Photophysical, photostability, and ROS generation properties of new trifluoromethylated quinoline-phenol Schiff bases
Inaiá O. Rocha, Yuri G. Kappenberg, Wilian C. Rosa, Clarissa P. Frizzo, Nilo Zanatta, Marcos A. P. Martins, Isadora Tisoco, Bernardo A. Iglesias and Helio G. Bonacorso
Beilstein J. Org. Chem. 2021, 17, 2799–2811. https://doi.org/10.3762/bjoc.17.191

How to Cite

Rocha, I. O.; Kappenberg, Y. G.; Rosa, W. C.; Frizzo, C. P.; Zanatta, N.; Martins, M. A. P.; Tisoco, I.; Iglesias, B. A.; Bonacorso, H. G. Beilstein J. Org. Chem. 2021, 17, 2799–2811. doi:10.3762/bjoc.17.191

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