Atomic defect classification of the H–Si(100) surface through multi-mode scanning probe microscopy

Jeremiah Croshaw, Thomas Dienel, Taleana Huff and Robert Wolkow
Beilstein J. Nanotechnol. 2020, 11, 1346–1360. https://doi.org/10.3762/bjnano.11.119

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Atomic defect classification of the H–Si(100) surface through multi-mode scanning probe microscopy
Jeremiah Croshaw, Thomas Dienel, Taleana Huff and Robert Wolkow
Beilstein J. Nanotechnol. 2020, 11, 1346–1360. https://doi.org/10.3762/bjnano.11.119

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Croshaw, J.; Dienel, T.; Huff, T.; Wolkow, R. Beilstein J. Nanotechnol. 2020, 11, 1346–1360. doi:10.3762/bjnano.11.119

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