Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir

Mathias Franz, Romy Junghans, Paul Schmitt, Adriana Szeghalmi and Stefan E. Schulz
Beilstein J. Nanotechnol. 2020, 11, 1439–1449. https://doi.org/10.3762/bjnano.11.128

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Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir
Mathias Franz, Romy Junghans, Paul Schmitt, Adriana Szeghalmi and Stefan E. Schulz
Beilstein J. Nanotechnol. 2020, 11, 1439–1449. https://doi.org/10.3762/bjnano.11.128

How to Cite

Franz, M.; Junghans, R.; Schmitt, P.; Szeghalmi, A.; Schulz, S. E. Beilstein J. Nanotechnol. 2020, 11, 1439–1449. doi:10.3762/bjnano.11.128

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