Cite the Following Article
Selected properties of AlxZnyO thin films prepared by reactive pulsed magnetron sputtering using a two-element Zn/Al target
Witold Posadowski, Artur Wiatrowski, Jarosław Domaradzki and Michał Mazur
Beilstein J. Nanotechnol. 2022, 13, 344–354.
https://doi.org/10.3762/bjnano.13.29
How to Cite
Posadowski, W.; Wiatrowski, A.; Domaradzki, J.; Mazur, M. Beilstein J. Nanotechnol. 2022, 13, 344–354. doi:10.3762/bjnano.13.29
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Scholarly Works
- Kiliszkiewicz, M.; Domaradzki, J.; Posadowski, W.; Mazur, M.; Wiatrowski, A.; Dawidowski, W.; Mazur, P.; Wojcieszak, D.; Chodasewicz, P.; Bartczak, M. Effect of sputtering power and oxygen partial pressure on structural and opto-electronic properties of Al-doped ZnO transparent conducting oxides. Applied Surface Science 2024, 670, 160601. doi:10.1016/j.apsusc.2024.160601
- Mazur, M.; Kiliszkiewicz, M.; Posadowski, W.; Domaradzki, J.; Małachowska, A.; Sokołowski, P. A Comprehensive Investigation of the Mechanical and Tribological Properties of AZO Transparent Conducting Oxide Thin Films Deposited by Medium Frequency Magnetron Sputtering. Materials (Basel, Switzerland) 2023, 17, 81. doi:10.3390/ma17010081
- Wall, J. M.; Yan, F. Sputtering Process of ScxAl1−xN Thin Films for Ferroelectric Applications. Coatings 2022, 13, 54. doi:10.3390/coatings13010054
