Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

Chang-Ming Wang, Hong-Sheng Chan, Chia-Li Liao, Che-Wei Chang and Wei-Ssu Liao
Beilstein J. Nanotechnol. 2023, 14, 34–44. https://doi.org/10.3762/bjnano.14.4

Cite the Following Article

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning
Chang-Ming Wang, Hong-Sheng Chan, Chia-Li Liao, Che-Wei Chang and Wei-Ssu Liao
Beilstein J. Nanotechnol. 2023, 14, 34–44. https://doi.org/10.3762/bjnano.14.4

How to Cite

Wang, C.-M.; Chan, H.-S.; Liao, C.-L.; Chang, C.-W.; Liao, W.-S. Beilstein J. Nanotechnol. 2023, 14, 34–44. doi:10.3762/bjnano.14.4

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