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Cite the Following Article
Low temperature atomic layer deposition of cobalt using dicobalt hexacarbonyl-1-heptyne as precursor
Mathias Franz, Mahnaz Safian Jouzdani, Lysann Kaßner, Marcus Daniel, Frank Stahr and Stefan E. Schulz
Beilstein J. Nanotechnol. 2023, 14, 951–963.
https://doi.org/10.3762/bjnano.14.78
How to Cite
Franz, M.; Safian Jouzdani, M.; Kaßner, L.; Daniel, M.; Stahr, F.; Schulz, S. E. Beilstein J. Nanotechnol. 2023, 14, 951–963. doi:10.3762/bjnano.14.78
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Scholarly Works
- Franz, M.; Jäckel, L.; Hu, X.; Kaßner, L.; Thurm, C.; Rittrich, D.; Helke, C.; Schuster, J.; Daniel, M.; Stahr, F.; Rüffer, N.; Kretschmer, R.; Schulz, S. E. Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures. Journal of Vacuum Science & Technology A 2025, 43. doi:10.1116/6.0004248