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Cite the Following Article
Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
Kristjan Kalam, Peeter Ritslaid, Tanel Käämbre, Aile Tamm and Kaupo Kukli
Beilstein J. Nanotechnol. 2023, 14, 1085–1092.
https://doi.org/10.3762/bjnano.14.89
How to Cite
Kalam, K.; Ritslaid, P.; Käämbre, T.; Tamm, A.; Kukli, K. Beilstein J. Nanotechnol. 2023, 14, 1085–1092. doi:10.3762/bjnano.14.89
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Scholarly Works
- Kalam, K.; Aan, M.-E.; Merisalu, J.; Otsus, M.; Ritslaid, P.; Kukli, K. Threshold Switching and Resistive Switching in SnO2-HfO2 Laminated Ultrathin Films. Crystals 2024, 14, 909. doi:10.3390/cryst14100909
