Supporting Information
Height evolution upon thermal processing of DNA origami deposited on Si, example of crater measurements from line profiles on AFM images, variation of surface coverage with ion beam fluence, and SEM and AFM images of trenches etched by FIB on DNA-origami-covered Si.
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Cite the Following Article
Ion beam processing of DNA origami nanostructures
Leo Sala, Agnes Zerolová, Violaine Vizcaino, Alain Mery, Alicja Domaracka, Hermann Rothard, Philippe Boduch, Dominik Pinkas and Jaroslav Kocišek
Beilstein J. Nanotechnol. 2024, 15, 207–214.
https://doi.org/10.3762/bjnano.15.20
How to Cite
Sala, L.; Zerolová, A.; Vizcaino, V.; Mery, A.; Domaracka, A.; Rothard, H.; Boduch, P.; Pinkas, D.; Kocišek, J. Beilstein J. Nanotechnol. 2024, 15, 207–214. doi:10.3762/bjnano.15.20
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Scholarly Works
- Ameixa, J.; Sala, L.; Kocišek, J.; Bald, I. Radiation and DNA Origami Nanotechnology: Probing Structural Integrity at the Nanoscale. Chemphyschem : a European journal of chemical physics and physical chemistry 2024, e202400863. doi:10.1002/cphc.202400863
