Electron-induced deposition using Fe(CO)4MA and Fe(CO)5 – effect of MA ligand and process conditions

Hannah Boeckers, Atul Chaudhary, Petra Martinović, Amy V. Walker, Lisa McElwee-White and Petra Swiderek
Beilstein J. Nanotechnol. 2024, 15, 500–516. https://doi.org/10.3762/bjnano.15.45

Supporting Information

Supporting Information features ESD (Figures S1 and S2) and post-irradiation TDS (Figure S3) data for Fe(CO)5, ESD at 20 eV electron energy (Figure S4) and corresponding post-irradiation TDS (Figure S5) for Fe(CO)4MA, a summary of AES intensities and data calculated from those for Fe(CO)5 (Table S1) and Fe(CO)4MA (Table S2), a plot of EAL values as function of electron energy and attenuation as function of overlayer thickness (Figure S6), TDS data for Fe(CO)4MA as function of coverage (Figure S7), and 1H NMR (Figure S8) and IR (Figure S9) spectra of Fe(CO)4MA.

Supporting Information File 1: Additional figures and tables.
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Cite the Following Article

Electron-induced deposition using Fe(CO)4MA and Fe(CO)5 – effect of MA ligand and process conditions
Hannah Boeckers, Atul Chaudhary, Petra Martinović, Amy V. Walker, Lisa McElwee-White and Petra Swiderek
Beilstein J. Nanotechnol. 2024, 15, 500–516. https://doi.org/10.3762/bjnano.15.45

How to Cite

Boeckers, H.; Chaudhary, A.; Martinović, P.; Walker, A. V.; McElwee-White, L.; Swiderek, P. Beilstein J. Nanotechnol. 2024, 15, 500–516. doi:10.3762/bjnano.15.45

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