Supporting Information
Figures S1, S2 and S6 present CAD-drawings of the patterns used within the CEBL process. Figure S3 discusses theoretical calculations of primary electron pathways within the used substrates. SEM pictures of 100 nm structures incubated with 16 nm AuNPs are shown in Figures S4 and S5. Figure S7 presents preliminary results of AuNP pattern formation on ITO-covered PET foils by this approach.
| Supporting Information File 1: Additional CAD-drawings, theoretical calculations and SEM pictures | ||
| Format: PDF | Size: 594.5 KB | Download |
Cite the Following Article
Guided immobilisation of single gold nanoparticles by chemical electron beam lithography
Patrick A. Schaal and Ulrich Simon
Beilstein J. Nanotechnol. 2013, 4, 336–344.
https://doi.org/10.3762/bjnano.4.39
How to Cite
Schaal, P. A.; Simon, U. Beilstein J. Nanotechnol. 2013, 4, 336–344. doi:10.3762/bjnano.4.39
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