Challenges in realizing ultraflat materials surfaces

Scholarly Works

• Kanevskii, V.; Fu, H.; Kolienov, S.; Grygoruk, V.; Zhang, H.; Stelmakh, O. Theoretical analysis of nanoscale local etching of a rough quartz surface under direct illumination. Optics express 2024, 32, 24728. doi:10.1364/oe.518668
• Kanevskii, V.; Kolienov, S.; Grygoruk, V.; Voiteshenko, I.; Zhang, H.; Fu, H. Enhanced technique for photochemical nano-polishing of a rough quartz surface: the numerical calculation of profile evolution. Applied optics 2023, 62, 2109. doi:10.1364/ao.478389
• Kanevskii, V.; Kolienov, S.; Grygoruk, V.; Stelmakh, O.; Zhang, H. Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination. Applied optics 2022, 61, 5128. doi:10.1364/ao.460844
• Ohtsu, M. Off-Shell Applications in Nanophotonics - Nano-fabrication technology based on the nature of the dressed photon. Off-Shell Applications in Nanophotonics; Elsevier, 2021; pp 71–93. doi:10.1016/b978-0-323-89849-2.00008-2
• Yatsui, T. Ultra-flat Surface Using a Near-Field Etching. Nano-Optics and Nanophotonics; Springer International Publishing, 2020; pp 23–74. doi:10.1007/978-3-030-42843-3_3
• Ohtsu, M. History, current developments, and future directions of near-field optical science. Opto-Electronic Advances 2020, 03, 190046. doi:10.29026/oea.2020.190046
• Yatsui, T.; Nakahira, Y.; Nakamura, Y.; Morimoto, T.; Kato, Y.; Yamamoto, M.; Yoshida, T.; Iida, K.; Nobusada, K. Realization of red shift of absorption spectra using optical near-field effect. Nanotechnology 2019, 30, 34LT02. doi:10.1088/1361-6528/ab2092
• Ohtsu, M.; Ojima, I.; Sakuma, H. Dressed Photon as an Off-Shell Quantum Field. Progress in Optics; Elsevier, 2019; Vol. 64, pp 45–97. doi:10.1016/bs.po.2018.11.002
• Yatsui, T.; Saito, H.; Nishioka, K.; Leuschel, B.; Soppera, O.; Nobusada, K. Effects of a power and photon energy of incident light on near-field etching properties. Applied Physics A 2017, 123, 1–6. doi:10.1007/s00339-017-1361-z
• Kang, J.; Kim, Y. H.; Kwon, S. J.; Park, J.-S.; Park, K. W.; Park, J.-G.; Han, I. K. Surface smoothing of indium tin oxide film by laser-induced photochemical etching. Japanese Journal of Applied Physics 2017, 56, 128003. doi:10.7567/jjap.56.128003
• Yatsui, T.; Saito, H.; Nobusada, K. Angstrom-scale flatness using selective nanoscale etching. Beilstein journal of nanotechnology 2017, 8, 2181–2185. doi:10.3762/bjnano.8.217
• Yatsui, T.; Yamaguchi, M.; Nobusada, K. Nano-scale chemical reactions based on non-uniform optical near-fields and their applications. Progress in Quantum Electronics 2017, 55, 166–194. doi:10.1016/j.pquantelec.2017.06.001
• Sakuma, H.; Ojima, I.; Ohtsu, M. Dressed photons in a new paradigm of off-shell quantum fields. Progress in Quantum Electronics 2017, 55, 74–87. doi:10.1016/j.pquantelec.2017.07.006
• Kang, J.; Lee, S.-e.; Park, J.-S.; Kim, Y. H.; Han, I. K. Surface smoothing of poly(methyl methacrylate) film by laser induced photochemical etching. Japanese Journal of Applied Physics 2017, 56, 090306. doi:10.7567/jjap.56.090306
• Brandenburg, F. J.; Okamoto, T.; Saito, H.; Leuschel, B.; Soppera, O.; Yatsui, T. Surface improvement of organic photoresists using a near-field-dependent etching method. Beilstein journal of nanotechnology 2017, 8, 784–788. doi:10.3762/bjnano.8.81
• Ohtsu, M. Progress in Dressed Photon Technology and the Future. Nano-Optics and Nanophotonics; Springer International Publishing, 2017; pp 1–18. doi:10.1007/978-3-319-49013-7_1
• Yatsui, T.; Nobusada, K. Near-Field Assisted Chemical Reactions and Its Applications. Nano-Optics and Nanophotonics; Springer International Publishing, 2017; pp 57–85. doi:10.1007/978-3-319-49013-7_3
• Yatsui, T.; Tsuboi, T.; Yamaguchi, M.; Nobusada, K.; Tojo, S.; Stehlin, F.; Soppera, O.; Bloch, D. Optically controlled magnetic-field etching on the nano-scale. Light, science & applications 2016, 5, e16054. doi:10.1038/lsa.2016.54
• Siddiqui, G.-u.-d.; Ali, J.; Doh, Y. H.; Choi, K. H. Fabrication of zinc stannate based all-printed resistive switching device. Materials Letters 2016, 166, 311–316. doi:10.1016/j.matlet.2015.12.045
• Nomura, W.; Yatsui, T.; Kawazoe, T.; Tate, N.; Ohtsu, M. High-speed flattening of crystallized glass substrates by dressed-photon–phonon etching. Applied Physics A 2015, 121, 1403–1407. doi:10.1007/s00339-015-9466-8

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