Correction: Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

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1Empa, Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures, Feuerwerkerstrasse 39, 3602 Thun, Switzerland
2AGH University of Science and Technology, Academic Centre for Materials and Nanotechnology, al. A. Mickiewicza 30, 30-059 Krakow, Poland
3Center for Semiconductor Components, State University of Campinas, 13083-870, Campinas, SP, Brazil
  1. Corresponding author email
Guest Editor: M. Huth
Beilstein J. Nanotechnol. 2015, 6, 1935–1936. https://doi.org/10.3762/bjnano.6.196
Received 25 Aug 2015, Accepted 04 Sep 2015, Published 21 Sep 2015

In Figure 8 of the original article, the scale of the ordinate was wrong. The correct figure looks as follows:

[2190-4286-6-196-1]

Figure 1: Figure 8 in the original article: Calculated resistivity from the resistance measurement of a Cu–C line during in situ post-growth heating with a hot plate (red dots) and cooling down (blue dots) inside the SEM chamber. The resistance did not change when opening the chamber. The top SEM images show the morphology changes of an adjacent FEBID line which was observed simultaneously during the in situ resistance measurement.

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