Cite the Following Article
Nanoporous Ge thin film production combining Ge sputtering and dopant implantation
Jacques Perrin Toinin, Alain Portavoce, Khalid Hoummada, Michaël Texier, Maxime Bertoglio, Sandrine Bernardini, Marco Abbarchi and Lee Chow
Beilstein J. Nanotechnol. 2015, 6, 336–342.
https://doi.org/10.3762/bjnano.6.32
How to Cite
Toinin, J. P.; Portavoce, A.; Hoummada, K.; Texier, M.; Bertoglio, M.; Bernardini, S.; Abbarchi, M.; Chow, L. Beilstein J. Nanotechnol. 2015, 6, 336–342. doi:10.3762/bjnano.6.32
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