Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition

Nicolas Sobel, Christian Hess, Manuela Lukas, Anne Spende, Bernd Stühn, M. E. Toimil-Molares and Christina Trautmann
Beilstein J. Nanotechnol. 2015, 6, 472–479. https://doi.org/10.3762/bjnano.6.48

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Conformal SiO2 coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
Nicolas Sobel, Christian Hess, Manuela Lukas, Anne Spende, Bernd Stühn, M. E. Toimil-Molares and Christina Trautmann
Beilstein J. Nanotechnol. 2015, 6, 472–479. https://doi.org/10.3762/bjnano.6.48

How to Cite

Sobel, N.; Hess, C.; Lukas, M.; Spende, A.; Stühn, B.; Toimil-Molares, M. E.; Trautmann, C. Beilstein J. Nanotechnol. 2015, 6, 472–479. doi:10.3762/bjnano.6.48

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