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Cite the Following Article
Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al2O3 and its application in imprinting lithography
Hyojeong Kim, Kristin Arbutina, Anqin Xu and Haitao Liu
Beilstein J. Nanotechnol. 2017, 8, 2363–2375.
https://doi.org/10.3762/bjnano.8.236
How to Cite
Kim, H.; Arbutina, K.; Xu, A.; Liu, H. Beilstein J. Nanotechnol. 2017, 8, 2363–2375. doi:10.3762/bjnano.8.236
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