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Cite the Following Article
A differential Hall effect measurement method with sub-nanometre resolution for active dopant concentration profiling in ultrathin doped Si1−xGex and Si layers
Richard Daubriac, Emmanuel Scheid, Hiba Rizk, Richard Monflier, Sylvain Joblot, Rémi Beneyton, Pablo Acosta Alba, Sébastien Kerdilès and Filadelfo Cristiano
Beilstein J. Nanotechnol. 2018, 9, 1926–1939.
https://doi.org/10.3762/bjnano.9.184
How to Cite
Daubriac, R.; Scheid, E.; Rizk, H.; Monflier, R.; Joblot, S.; Beneyton, R.; Acosta Alba, P.; Kerdilès, S.; Cristiano, F. Beilstein J. Nanotechnol. 2018, 9, 1926–1939. doi:10.3762/bjnano.9.184
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