Exploring the photoleakage current and photoinduced negative bias instability in amorphous InGaZnO thin-film transistors with various active layer thicknesses

Dapeng Wang and Mamoru Furuta
Beilstein J. Nanotechnol. 2018, 9, 2573–2580. https://doi.org/10.3762/bjnano.9.239

Cite the Following Article

Exploring the photoleakage current and photoinduced negative bias instability in amorphous InGaZnO thin-film transistors with various active layer thicknesses
Dapeng Wang and Mamoru Furuta
Beilstein J. Nanotechnol. 2018, 9, 2573–2580. https://doi.org/10.3762/bjnano.9.239

How to Cite

Wang, D.; Furuta, M. Beilstein J. Nanotechnol. 2018, 9, 2573–2580. doi:10.3762/bjnano.9.239

Download Citation

Citation data can be downloaded as file using the "Download" button or used for copy/paste from the text window below.
Citation data in RIS format can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Zotero.

Presentation Graphic

Picture with graphical abstract, title and authors for social media postings and presentations.
Format: PNG Size: 577.0 KB Download

Citations to This Article

Up to 20 of the most recent references are displayed here.

Scholarly Works

  • Rodriguez-Davila, R. A.; Chapman, R. A.; Shamsi, Z. H.; Castillo, S.; Young, C. D.; Quevedo-Lopez, M. A. Low temperature, highly stable ZnO thin-film transistors. Microelectronic Engineering 2023, 279, 112063. doi:10.1016/j.mee.2023.112063
  • Vogt, K. T.; Malmberg, C. E.; Buchanan, J. C.; Mattson, G. W.; Brandt, G. M.; Fast, D. B.; Cheong, P. H.-Y.; Wager, J. F.; Graham, M. W. Ultrabroadband density of states of amorphous In-Ga-Zn-O. Physical Review Research 2020, 2, 033358. doi:10.1103/physrevresearch.2.033358
  • Ui, T.; Fujimoto, R.; Sakai, T.; Matsuo, D.; Setoguchi, Y.; Andoh, Y.; Tatemichi, J. Characteristics of noble-gas-ion-implanted amorphous-InGaZnO films on glass. In 2020 27th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD), IEEE, 2020; pp 119–122. doi:10.23919/am-fpd49417.2020.9224487
  • Wang, D.; Li, D.; Zhao, W.; Furuta, M. Defect gradient control in amorphous InGaZnO for high-performance thin-film transistors. Journal of Physics D: Applied Physics 2020, 53, 135104. doi:10.1088/1361-6463/ab642e
  • Tsai, Y.-L.; Chien, Y.-C.; Chang, T.-C.; Tsao, Y.-C.; Tai, M.-C.; Tu, H.-Y.; Chen, J.-J.; Wang, Y.-X.; Zhou, K.-J.; Shih, Y.-S.; Lu, I.-N.; Huang, H.-C. Improving Reliability of High-Performance Ultraviolet Sensor in a-InGaZnO Thin-Film Transistors. IEEE Electron Device Letters 2019, 40, 1455–1458. doi:10.1109/led.2019.2929624
  • Wang, D.; Furuta, M. Quantitative analysis of annealing-induced instabilities of photo-leakage current and negative-bias-illumination-stress in a-InGaZnO thin-film transistors. Beilstein journal of nanotechnology 2019, 10, 1125–1130. doi:10.3762/bjnano.10.112
  • Wang, D.; Zhao, W.; Furuta, M. Collaborative optimization of thermal budget annealing and active layer defect content enhancing electrical characteristics and bias stress stability in InGaZnO thin-film transistors. Journal of Physics D: Applied Physics 2019, 52, 235101. doi:10.1088/1361-6463/ab10fc
Other Beilstein-Institut Open Science Activities