Supporting Information
Explains the input and output files of the pattern generator program in detail (see also Figure 1). The parameters of the settings file setf are defined. The structure of the geometry file geof and the generated pattern file are shown. The usage of the illustration file and the description file is demonstrated.
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Cite the Following Article
Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition
Lukas Keller and Michael Huth
Beilstein J. Nanotechnol. 2018, 9, 2581–2598.
https://doi.org/10.3762/bjnano.9.240
How to Cite
Keller, L.; Huth, M. Beilstein J. Nanotechnol. 2018, 9, 2581–2598. doi:10.3762/bjnano.9.240
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