Cite the Following Article
Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films
Alexander Gaul, Daniel Emmrich, Timo Ueltzhöffer, Henning Huckfeldt, Hatice Doğanay, Johanna Hackl, Muhammad Imtiaz Khan, Daniel M. Gottlob, Gregor Hartmann, André Beyer, Dennis Holzinger, Slavomír Nemšák, Claus M. Schneider, Armin Gölzhäuser, Günter Reiss and Arno Ehresmann
Beilstein J. Nanotechnol. 2018, 9, 2968–2979.
https://doi.org/10.3762/bjnano.9.276
How to Cite
Gaul, A.; Emmrich, D.; Ueltzhöffer, T.; Huckfeldt, H.; Doğanay, H.; Hackl, J.; Khan, M. I.; Gottlob, D. M.; Hartmann, G.; Beyer, A.; Holzinger, D.; Nemšák, S.; Schneider, C. M.; Gölzhäuser, A.; Reiss, G.; Ehresmann, A. Beilstein J. Nanotechnol. 2018, 9, 2968–2979. doi:10.3762/bjnano.9.276
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