Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

Leo Sala, Iwona B. Szymańska, Céline Dablemont, Anne Lafosse and Lionel Amiaud
Beilstein J. Nanotechnol. 2018, 9, 57–65. https://doi.org/10.3762/bjnano.9.8

Cite the Following Article

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)
Leo Sala, Iwona B. Szymańska, Céline Dablemont, Anne Lafosse and Lionel Amiaud
Beilstein J. Nanotechnol. 2018, 9, 57–65. https://doi.org/10.3762/bjnano.9.8

How to Cite

Sala, L.; Szymańska, I. B.; Dablemont, C.; Lafosse, A.; Amiaud, L. Beilstein J. Nanotechnol. 2018, 9, 57–65. doi:10.3762/bjnano.9.8

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