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Beilstein J. Nanotechnol. 2015, 6, 704–710, doi:10.3762/bjnano.6.71
Figure 1: (a) Schematic front view and (b) side view of the Si substrate produced by Fondazione Bruno Kessler...
Figure 2: (a) Scanning electron microscopy (SEM) image of MWCNT samples grown on the implantation area. The i...
Figure 3: Dark current comparison of the Si substrate and the CNT–Si heterojunction.
Figure 4: (a) Details of the dark current around the threshold voltage with a curve fit. (b) C–V plot of the ...
Figure 5: (a) Photocurrent induced by a 730 nm continuous wave, low power light source at various illuminatio...
Figure 6: (a) Dark current and photocurrent tunneling in a CNT–Si heterojunction under 378 nm light illuminat...