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1 article(s) from Mukherjee, Joy

Performance optimization of a microwave-coupled plasma-based ultralow-energy ECR ion source for silicon nanostructuring

Joy Mukherjee,
Safiul Alam Mollick,
Tanmoy Basu and
Tapobrata Som

Beilstein J. Nanotechnol. 2025, 16, 484–494, doi:10.3762/bjnano.16.37

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Figure 1: Block diagram of the components of the high-vacuum plasma ion source.

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Figure 2: Cross-sectional schematic view of the microwave-coupled ultralow-energy ion beam system.

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Figure 3: Variation of beam current with (a–c) gas pressure and (d–f) magnetron power for different ion energ...

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Figure 4: Variation of (a–c) beam current with ion extraction voltage at different ion energy; (d) beam curre...

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Figure 5: AFM image (2D and 3D) of the evolution of surface morphology after 450 eV Ar-ion bombardment at dif...

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Figure 6: Variation of (a–c) surface height modulation of the nanopatterned silicon surface; (d) ripple wavel...

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Figure 7: AFM images (2D and 3D) of the evolution of nanostructures on the Si surface with irradiation time a...

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Figure 8: (a) UV–vis spectra of pristine and nanopatterned surfaces, (b) variation of rms roughness and refle...

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Published 31 Mar 2025

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