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Beilstein J. Nanotechnol. 2024, 15, 1132–1141, doi:10.3762/bjnano.15.92
Figure 1: XRD patterns of p-Si, p-type SiNWs, and the TiO2/SiNWs sample.
Figure 2: Cross-sectional view (a, b) and top view (c, d) SEM images of the TiO2/SiNWs device with a higher-m...
Figure 3: The UV–visible diffuse reflectance spectra (a) and I–V curve under light/dark conditions (b) of the...
Figure 4: Raman spectra of pure p-Si and Si NW (a), and the TiO2/SiNWs thin film (b).
Figure 5: Photocatalytic CH4 oxidation as a function of irradiation time (a) and different CH4/air compositio...
Figure 6: Photocatalytic CH4 oxidation over different types of catalyst (a), and under different types of irr...
Figure 7: Stability of photocatalytic CH4 oxidation reaction over the TiO2/SiNWs sample.
Figure 8: Proposed mechanism of photocatalytic CH4 oxidation reaction over p–n junction TiO2/SiNWs sample.
Figure 9: Schematic illustration of TiO2/SiNWs chip fabrication starting from a p-type silicon wafer. A thin ...