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Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32
Figure 1: SRIM calculations of the implant distribution of Te (red) and Se (blue) atoms in Ge. The distributi...
Figure 2: SEM plan-view images of the as-implanted Se sample: (1) low resolution view showing the different t...
Figure 3: Thermal annealing effects on the co-implanted Se/Te sample: (1) as-implanted, (2) TB = 4.1 µm; (3) ...
Figure 4: (1) and (2) TEM cross-sectional view of the Se-implanted sample after annealing with TB = 3.1 µm. (...
Figure 5: SEM plan-view image obtained after annealing a 340 nm thick Ge layer sputtered on the native Si oxi...