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Search for "charge compensation" in Full Text gives 29 result(s) in Beilstein Journal of Nanotechnology.

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

  • Ulrich C. Fischer,
  • Carsten Hentschel,
  • Florian Fontein,
  • Linda Stegemann,
  • Christiane Hoeppener,
  • Harald Fuchs and
  • Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

Graphical Abstract
  • (Figure 4c). This indicates that in this case a double layer of the negatively charged gold nanoparticles might be adsorbed. Unlike in the case of the specific chemical binding of the fluorescein tags, more or less than a monolayer can be bound to the positively charged nanopattern due to charge
  • compensation, depending on the surface charges of the nanopattern and of the nanoparticles which may alter their properties under different conditions of the sample preparation. For the 0.22 µm nanopattern, which cannot be identified in the fluorescence images, the topography images taken on the same
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Published 03 Sep 2014

Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

  • Federico Baiutti,
  • Georg Christiani and
  • Gennady Logvenov

Beilstein J. Nanotechnol. 2014, 5, 596–602, doi:10.3762/bjnano.5.70

Graphical Abstract
  • , for instance, to solubility limits or to the tendency of atoms intermixing at interfaces resulting in cationic redistribution or intergrowth of secondary phases. Moreover, how do charge compensation mechanisms act at interfaces? What is the result of the “polar discontinuity” and of the presence of
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Published 08 May 2014

Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

  • Tatjana Ladnorg,
  • Alexander Welle,
  • Stefan Heißler,
  • Christof Wöll and
  • Hartmut Gliemann

Beilstein J. Nanotechnol. 2013, 4, 638–648, doi:10.3762/bjnano.4.71

Graphical Abstract
  • about 200 nm with nominal mass resolution (burst alignment mode). No charge compensation was required. Spectra were calibrated on omnipresent C−, CH−, CH2−, Au−, and molecular peaks. (a) Building units for the growth of MOF HKUST-1 and the unit cell of HKUST-1. (b) The principle of the layer-by-layer
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Published 11 Oct 2013

Noncontact atomic force microscopy study of the spinel MgAl2O4(111) surface

  • Morten K. Rasmussen,
  • Kristoffer Meinander,
  • Flemming Besenbacher and
  • Jeppe V. Lauritsen

Beilstein J. Nanotechnol. 2012, 3, 192–197, doi:10.3762/bjnano.3.21

Graphical Abstract
  • Co3O4(111) films with the spinel structure [13][14] show evidence for an apparently unreconstructed (1×1) surface, the stability of which was proposed to be based on a Co2+/Co3+ inversion process leading to charge compensation. In the present case of MgAl2O4(111), no previous experimental studies are
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Published 06 Mar 2012
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