Nanolesions induced by heavy ions in human tissues: Experimental and theoretical studies

• Marcus Bleicher,
• Lucas Burigo,
• Marco Durante,
• Maren Herrlitz,
• Michael Krämer,
• Igor Mishustin,
• Iris Müller,
• Francesco Natale,
• Igor Pshenichnov,
• Stefan Schramm,
• Gisela Taucher-Scholz and
• Cathrin Wälzlein

Beilstein J. Nanotechnol. 2012, 3, 556–563, doi:10.3762/bjnano.3.64

• [7], whose purpose is to properly describe the creation and transport of low energy electrons, has been extended to describe inhomogeneous targets. Results and Discussion Nanolesions in different regions of the chromatin Physics obviously predicts that streaks produced by heavy ions in the DNA should

Radiation-induced nanostructures: Formation processes and applications

• Michael Huth

Beilstein J. Nanotechnol. 2012, 3, 533–534, doi:10.3762/bjnano.3.61

• tissue, define a principle of nanostructure formation by destructive means. But there is a deeper connection on the microscopic level. In FEBID the dominating contribution to the dissociation yield stems from low-energy electrons in the energy range between a few to several hundred electron volts

• . Different processes, such as dissociative electron attachment, neutral dissociation or dissociative ionization act together in breaking selected bonds in (mostly) metal–organic precursor molecules. On the other hand, low-energy electrons also play a role in the radiation damage induced by ionizing radiation

• deeper insight into the biological effectiveness and long-term risks caused by low-energy electrons could be expected. On the theoretical level, this poses a highly complex problem on multiple scales, ranging from the sub-nanometer to the mesoscopic range, at time scales from femtoseconds to microseconds

Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

• Zhe She,
• Andrea DiFalco,
• Georg Hähner and
• Manfred Buck

Beilstein J. Nanotechnol. 2012, 3, 101–113, doi:10.3762/bjnano.3.11

• substantial reduction in the nucleation density. This is illustrated in Figure 2b in which a spatial profile in the irradiation dose by e-beam lithography generates an inverted profile in the nucleation rate. It is noted that the cross-linking in the SAM is primarily caused by low-energy electrons (<100 eV