Angstrom-scale flatness using selective nanoscale etching

• Takashi Yatsui,
• Hiroshi Saito and
• Katsuyuki Nobusada

Beilstein J. Nanotechnol. 2017, 8, 2181–2185, doi:10.3762/bjnano.8.217

• that near-field etching is an effective way to etch on the scale of less than 10 nm for both wet and dry etching techniques. In addition, near-field dry etching may be effective for the selective etching of nanoscale structures with large mean free path values. Keywords: Angstrom-scale flatness

• etching on smaller scales less than 10 nm for both wet and dry etching. In addition, by comparing wet and dry etching, near-field dry etching was shown to be effective for the selective etching of nanoscale structures because of the large value of the mean free path of the etching molecules. Hence

Non-intuitive clustering of 9,10-phenanthrenequinone on Au(111)

• Ryan D. Brown,
• Rebecca C. Quardokus,
• Natalie A. Wasio,
• Jacob P. Petersen,
• Angela M. Silski,
• Steven A. Corcelli and
• S. Alex Kandel

Beilstein J. Nanotechnol. 2017, 8, 1801–1807, doi:10.3762/bjnano.8.181

• conditions, including clusters with pentagonal symmetry [12][13][14][15] and quasicrystalline assemblies of these pentagonal subunits [16]. In order to exploit non-equilibrium growth methods to produce nanoscale structures, the origin of these metastable species needs to be investigated. An improved

• understanding of these processes not only allows for the creation of nanoscale structures with non-equilibrium geometries, but also might improve our understanding of polymorphism in organic crystals [17][18]. Some hydrogen-bonding organic molecules have a common feature in that C–H···O bonding plays a critical

• presence of these tetramers, then it might be an exploitable method for producing nanoscale structures via kinetically controlled self-assembly. These experiments were repeated using 9-fluorenone in order to test the role of molecular geometry in determining the metastable species produced during pulse

Analysis and modification of defective surface aggregates on PCDTBT:PCBM solar cell blends using combined Kelvin probe, conductive and bimodal atomic force microscopy

• Hanaul Noh,
• Alfredo J. Diaz and
• Santiago D. Solares

Beilstein J. Nanotechnol. 2017, 8, 579–589, doi:10.3762/bjnano.8.62

• derivatives are attractive for inexpensive energy harvesting. Extensive research on polymer solar cells has provided insight into the factors governing device-level efficiency and stability. However, the detailed investigation of nanoscale structures is still challenging. Here we demonstrate the analysis and

Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography

• Siti Noorhaniah Yusoh and
• Khatijah Aisha Yaacob

Beilstein J. Nanotechnol. 2016, 7, 1461–1470, doi:10.3762/bjnano.7.138

• units and proceeds to small units [22][23]. This approach is a well-known method for the fabrication of semiconductor devices in micro and nanoscale structures [24][25]. A biased AFM tip is operated under ambient conditions to oxidize the silicon surface locally and form an oxide mask [26]. Several

Length-extension resonator as a force sensor for high-resolution frequency-modulation atomic force microscopy in air

• Hannes Beyer,
• Tino Wagner and
• Andreas Stemmer

Beilstein J. Nanotechnol. 2016, 7, 432–438, doi:10.3762/bjnano.7.38

• ; frequency-modulation atomic force microscopy; high-resolution; length-extension resonator; Introduction Frequency-modulated atomic force microscopy (FM-AFM) is the method of choice to image nanoscale structures on surfaces down to the atomic level. Whereas atomic resolution is routinely achieved in ultra

Electrospray deposition of organic molecules on bulk insulator surfaces

• Antoine Hinaut,
• Rémy Pawlak,
• Ernst Meyer and
• Thilo Glatzel

Beilstein J. Nanotechnol. 2015, 6, 1927–1934, doi:10.3762/bjnano.6.195

• hybrid-photovoltaic [1] or molecular electronics [2]. Information at the single molecular level, even if challenging, is required to foresee the interplay between nanoscale structures and geometries and the device properties. For reliable investigations of such systems, a well defined environment is

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

• Rachel M. Thorman,
• Ragesh Kumar T. P.,
• D. Howard Fairbrother and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

• induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in resolution due to deposition

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• lithography; exposure dose; high-resolution lithography; nanomagnets; nanostructure; overexposure; PMMA; polymer; resist carbonization; Introduction The continuous growth of the nanotechnology and microelectronic industries requires the development of new approaches and methods for the formation of nanoscale

• structures of desired geometry with a spatial resolution of less than 100 nm. One of the most advanced and in-demand technologies is mask-free or direct-write lithography based on the interaction of an electron beam with a polymer resist [1]. Under normal conditions, electron-beam lithography (EBL) enables

Overview of nanoscale NEXAFS performed with soft X-ray microscopes

• Peter Guttmann and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2015, 6, 595–604, doi:10.3762/bjnano.6.61

• nanoscale structures are becoming more and more important. Not only for the further miniaturization of semiconductor devices like carbon nanotube based transistors, but also for newly developed efficient energy storage devices, gas sensors or catalytic systems nanoscale and functionalized materials have to

SERS and DFT study of copper surfaces coated with corrosion inhibitor

• Maurizio Muniz-Miranda,
• Francesco Muniz-Miranda and
• Stefano Caporali

Beilstein J. Nanotechnol. 2014, 5, 2489–2497, doi:10.3762/bjnano.5.258

• substrate must exhibit a surface roughness at the nanometer level. In these nanoscale structures, the excitation of electrons from the metal surface by laser irradiation can be confined, resulting in plasmon resonance [16]. The existence of this resonance is a necessary condition to observe a SERS signal by

Challenges in realizing ultraflat materials surfaces

• Takashi Yatsui,
• Wataru Nomura,
• Fabrice Stehlin,
• Olivier Soppera,
• Makoto Naruse and
• Motoichi Ohtsu

Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99

• that utilize the optical near field generated in nanoscale semiconductor quantum structures and the dipole-forbidden near-field energy transfer. Moreover, near-field optics has been used to fabricate nanoscale structures beyond the diffraction limit of light. For example, photolithography has been used

• , we next use the framework of the DPP theory to review a nanophotonic fabrication process that realizes angstrom-scale flattening of substrate surfaces. Dressed photon–phonon etching DPPs can be consistently generated by irradiating a rough material surface with nanoscale structures. The generated

Near-field effects and energy transfer in hybrid metal-oxide nanostructures

• Ulrich Herr,
• Barat Achinuq,
• Cahit Benel,
• Giorgos Papageorgiou,
• Manuel Goncalves,
• Johannes Boneberg,
• Paul Leiderer,
• Paul Ziemann,
• Peter Marek and
• Horst Hahn

Beilstein J. Nanotechnol. 2013, 4, 306–317, doi:10.3762/bjnano.4.34

• -Helmholtz-Platz 1,76344 Eggenstein-Leopoldshafen, Germany 10.3762/bjnano.4.34 Abstract One of the big challenges of the 21st century is the utilization of nanotechnology for energy technology. Nanoscale structures may provide novel functionality, which has been demonstrated most convincingly by successful

Friction and durability of virgin and damaged skin with and without skin cream treatment using atomic force microscopy

• Bharat Bhushan,
• Si Chen and
• Shirong Ge

Beilstein J. Nanotechnol. 2012, 3, 731–746, doi:10.3762/bjnano.3.83

• nanoscale structures, and therefore an understanding of the nanoscale friction and durability is necessary. In this research, friction and durability of virgin and damaged skin were measured on the nanoscale to study the differences between them. The skin treated with skin cream was compared to untreated

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• intensively studied over the past two decades and allows the formation of complex layered or lateral micro- or nanoscale structures [31][32][33][34][35][36][37][38]. These structures can be used for many applications, such as antireflection coatings [39], photovoltaic devices [40][41], organic light-emitting

Self-assembly at solid surfaces

• Sidney R. Cohen and
• Jacob Sagiv

Beilstein J. Nanotechnol. 2011, 2, 824–825, doi:10.3762/bjnano.2.91

• areas of research. Thus, the functionality of self-assembled films or of structures derived from them is demonstrated, including mechanical, electrical, and catalytic properties. Unique nanoscale structures are prepared employing lithographic processes and the templating capabilities of the films

The atomic force microscope as a mechano–electrochemical pen

• Christian Obermair,
• Andreas Wagner and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2011, 2, 659–664, doi:10.3762/bjnano.2.70

• patterns can be written reproducibly. Nanoscale structures and lines of copper were deposited, and the line widths ranged between 5 nm and 80 nm, depending on the deposition parameters. A procedure for the sequential writing of metallic nanostructures is introduced, based on the understanding of the