Synthesis of Pt nanoparticles and their burrowing into Si due to synergistic effects of ion beam energy losses

• Pravin Kumar,
• Udai Bhan Singh,
• Kedar Mal,
• Sunil Ojha,
• Indra Sulania,
• Dinakar Kanjilal,
• Dinesh Singh and
• Vidya Nand Singh

Beilstein J. Nanotechnol. 2014, 5, 1864–1872, doi:10.3762/bjnano.5.197

• silicon surfaces (cut from the same sample) joined face-to-face with glue (epoxy/adhesive substance). The range of 50 keV neon ions in Si is ≈107 nm with a longitudinal straggling of ≈46 nm. Therefore, one can expect a modified region of ≈130 nm below the surface upon ion bombardment. However, an

Topology assisted self-organization of colloidal nanoparticles: application to 2D large-scale nanomastering

• Hind Kadiri,
• Serguei Kostcheev,
• Daniel Turover,
• Rafael Salas-Montiel,
• Komla Nomenyo,
• Anisha Gokarna and
• Gilles Lerondel

Beilstein J. Nanotechnol. 2014, 5, 1203–1209, doi:10.3762/bjnano.5.132

• based on the topology assisted self-assembly of polystyrene beads (PS) on patterned silicon surfaces. The development of self-organization of PS beads on silicon substrates allows us to obtain a single crystal, which is 100 times larger compared to the ones on non-patterned Si surfaces. The actual size

• . Fabrication of silicon nanostructures produced by direct etching Reactive ion etching (RIE) was implemented for the dry etching of the silicon surfaces by using the beads as a mask. The gases used for RIE were SF6 and O2. The regions covered by the beads are not etched by RIE. In this manner, we obtained a

Photovoltaic properties of ZnO nanorods/p-type Si heterojunction structures

• Rafal Pietruszka,
• Bartlomiej S. Witkowski,
• Grzegorz Luka,
• Lukasz Wachnicki,
• Sylwia Gieraltowska,
• Krzysztof Kopalko,
• Eunika Zielony,
• Piotr Bieganski,
• Ewa Placzek-Popko and
• Marek Godlewski

Beilstein J. Nanotechnol. 2014, 5, 173–179, doi:10.3762/bjnano.5.17

• sizes and density were grown on silicon surfaces by the hydrothermal method. AZO films were grown at a low deposition temperature in the ALD process. This method has the potential of scaling up substrate sizes to more than 1 m2. A wide spectral range of the absorption (from 350 nm to 1200 nm) was

Selective surface modification of lithographic silicon oxide nanostructures by organofunctional silanes

• Thomas Baumgärtel,
• Christian von Borczyskowski and
• Harald Graaf

Beilstein J. Nanotechnol. 2013, 4, 218–226, doi:10.3762/bjnano.4.22

• investigations. Routes for the preparation of methyl- or amino-terminated structures or silicon surfaces are presented and discussed. The formation of silane monolayers on nanoscopic silicon oxide nanostructures was found to be much more sensitive towards ambient humidity than, e.g., the silanization of larger

• functional group. This group is reactive towards nucleophiles such as amine or thiol groups. A successful large-scale binding of FITC to amino-terminated silicon surfaces [27] has been demonstrated previously by fluorescence measurements [28]. The attachment of FITC on the oxide nanostructures is realized in

• packed and well-ordered monolayers on silicon surfaces [29][30]. Results and Discussion Successful routes towards silane-functionalization of silicon oxide nanostructures Prior to the multistep attachment of FITC through APTES linkers, the controlled and dense binding of silane molecules to the silicon

Controlled deposition and combing of DNA across lithographically defined patterns on silicon

• Zeinab Esmail Nazari and
• Leonid Gurevich

Beilstein J. Nanotechnol. 2013, 4, 72–76, doi:10.3762/bjnano.4.8

• substrates such as mica, glass, plastic, etc., which are more convenient for DNA deposition and DNA studies, whereas only a few have attempted to adapt the technique to silicon surfaces [11]. However, since silicon is the most common material in micro- and nanofabrication, the dream of DNA-based chips [15

• the hydrophobic silane on top of the SiO2 layer. On these surfaces, water droplets exhibited average contact angles of about 90° as determined by the sessile droplet method. Positively charged silicon surfaces (used for the reference experiment shown in Figure 2a) were produced by the same technique

Effect of spherical Au nanoparticles on nanofriction and wear reduction in dry and liquid environments

• Dave Maharaj and
• Bharat Bhushan

Beilstein J. Nanotechnol. 2012, 3, 759–772, doi:10.3762/bjnano.3.85

• reduction. Previous studies have been performed using a colloidal glass sphere attached to an AFM cantilever on bare silicon surfaces [35] and in multiple-nanoparticle contact with both immobile asperities on polymer surfaces [36] and mobile nanoparticles, such as spherical Au and SiO2 nanoparticles on

• silicon surfaces [31]. In these studies, friction forces were reduced due to the reduced contact area provided and, in the case of Au and SiO2, the possible sliding and possible rolling of individual nanoparticles. Similar to single-nanoparticle contact studies, AFM studies of multiple-nanoparticle

Manipulation of gold colloidal nanoparticles with atomic force microscopy in dynamic mode: influence of particle–substrate chemistry and morphology, and of operating conditions

• Samer Darwich,
• Karine Mougin,
• Akshata Rao,
• Enrico Gnecco,
• Shrisudersan Jayaraman and
• Hamidou Haidara

Beilstein J. Nanotechnol. 2011, 2, 85–98, doi:10.3762/bjnano.2.10

• , this parameter could be ignored for determining the deflection angle. As a result, patterned surfaces were chosen for this determination, rather than the flat bare silicon surfaces. The influence of the spacing b separating two scan paths on the deflection angle has been shown by simulation of these