Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

• Ulrich C. Fischer,
• Carsten Hentschel,
• Florian Fontein,
• Linda Stegemann,
• Christiane Hoeppener,
• Harald Fuchs and
• Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

• growth and mobility of cells on surfaces [14]. Top-down as well as bottom-up fabrication methods are applied in the field of chemical nanostructuring. Thus, chemical nanopatterns were formed by using different approaches, including electro-oxidative nanolithography [15], electron beam lithography [16

• exploited to test the resolution potential of the fabrication methods, other methods of bottom-up fabrication of the metal masks are desirable for this purpose. For the fabrication of metal masks as used here the block-copolymer micelle nanolithography [18], the silver decoration technique or other

Nanostructure sensitization of transition metal oxides for visible-light photocatalysis

• Hongjun Chen and
• Lianzhou Wang

Beilstein J. Nanotechnol. 2014, 5, 696–710, doi:10.3762/bjnano.5.82

• their easy fabrication methods in addition to their unique properties carbon nanodots are a versatile material candidate for bioimaging, sensors, catalysis and photovoltaic devices [107][108][109][110]. There are also some reviews covering the synthetic methods, physical and chemical properties, and

Optimization of solution-processed oligothiophene:fullerene based organic solar cells by using solvent additives

• Gisela L. Schulz,
• Marta Urdanpilleta,
• Roland Fitzner,
• Eduard Brier,
• Elena Mena-Osteritz,
• Egon Reinold and
• Peter Bäuerle

Beilstein J. Nanotechnol. 2013, 4, 680–689, doi:10.3762/bjnano.4.77

• efficiency (3.0 vs 3.5%) for the two fabrication methods demonstrates the versatility of our DCV5T-Bu4 material in contrast to, e.g., a merocyanine dye reported in literature (2.9 vs 4.9%) [43] or squarine dye (2.7 vs 4.1%) [44]. Conclusion We have demonstrated that the acceptor-substituted quinquethiophene

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• resin cast of the pillars, coated with metal films, allows us to invert the structure and obtain arrays of triangular holes within the metal. Both fabrication methods illustrate the preparation of large arrays of nanocavities within metal films at low cost. Gold films of different thicknesses were

• sensitivity of these effects to the shape and size of the structures means that we require good reproducibility in the fabrication technique and good knowledge of the optical properties. However, some applications demand structures of extended size. Thus, the optimization of fabrication methods is intimately