Beilstein J. Nanotechnol.2011,2, 333–338, doi:10.3762/bjnano.2.39
substrates with an R450 molecularbeamepitaxy (MBE) system from DCA Oy, Finland. The flux was determined by beam equivalent pressures (BEP) for all source materials. The partial Ga pressure was kept nearly constant between ≈1.60 and ≈1.89 × 10−7 hPa, for each individual growth process. Depending on the
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Figure 1:
Top: AFM images of samples grown at a temperature of T = 527 °C and a nominal coverage of 3 ML, but...