Beilstein J. Nanotechnol.2012,3, 134–143, doi:10.3762/bjnano.3.14
–2 nm. On small dotlike template sites, this metal growth mode yields discrete Ag nanodots (Figure 2 and Figure 3, top row), whereas continuous Ag nanowires with a bamboolike structure of higher and lower metal features are formed on narrow template lines (Figure 3, middle row left). Identical
silver nanodots fabricated by this serial CET process are similar to those produced in the parallel CET mode (Figure 2 and Figure 3); however, the serial process offers the option of precise control over the generation of discrete nanoparticles at isolated sites within each OTSeo template line, in
nanodots and nanowires, may be achieved by using metal-film stamps in the parallel-metallization mode (Figure 2 and Figure 3), serial generation of metal/monolayer nanoobjects occupying only a limited portion of the total area of the respective monolayer-template features (such as the nanodots in Figure 5
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Figure 1:
Scheme of parallel-contact electrochemical metallization of a OTSeo@OTS/Si template nanopattern (ta...
Beilstein J. Nanotechnol.2012,3, 114–122, doi:10.3762/bjnano.3.12
protocols of particle lithography combined with either vapor deposition, immersion, or contact printing. Changing the physical approaches for applying molecules to masked surfaces produced OTS nanostructures with different shapes and heights. Ring nanostructures, nanodots and uncovered pores of OTS were
-shaped nanostructures were produced by using latex-particle lithography with immersion, as shown in Figure 5 with wide-area and zoom-in topography views. The long-range periodicity of the array of nanodots is shown with an FFT within the inset of Figure 5a. The surface density of the nanodots is
approximately 3.3 × 109 nanostructures/cm2, showing ~120 nanopatterns within the 2.5 × 2.5 µm2 frame shown in Figure 5b. The heights of the nanodots measure 0.5 ± 0.3 nm.
Immersion of a masked substrate in a solvent is the most common approach for preparing films of OTS, and has produced the most consistent
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Figure 1:
Strategies for preparing organosilane nanostructures by means of particle lithography. Basic steps ...