Dry friction of microstructured polymer surfaces inspired by snake skin

• Martina J. Baum,
• Lars Heepe,
• Elena Fadeeva and
• Stanislav N. Gorb

Beilstein J. Nanotechnol. 2014, 5, 1091–1103, doi:10.3762/bjnano.5.122

• using e-beam greytone lithography with a negative photoresist. Afterwards nickel copies were manufactured through an electroplating process. Replication of the microstructures was performed by using a two-step moulding technique according to Gorb [35]. The surface that ought to be replicated was used as

Effect of contaminations and surface preparation on the work function of single layer MoS₂

• Oliver Ochedowski,
• Kolyo Marinov,
• Nils Scheuschner,
• Artur Poloczek,
• Benedict Kleine Bussmann,
• Janina Maultzsch and
• Marika Schleberger

Beilstein J. Nanotechnol. 2014, 5, 291–297, doi:10.3762/bjnano.5.32

• (graphene supermarket, Calverton, NY, USA). The SiO2 was patterned by using an inductive coupled plasma reactive ion etching (ICP-RIE) with Cl2/N2 chemistry. The etching mask used was a standard photoresist patterned by optical lithography. The etching was performed at 35 °C using 300 W of ICP and 150 W

• strained on the edge of the hole, it allows to experimentally compare the effect of two differently treated subtrates (SiO2 and RIE SiO2) on the same MoS2 flake. After identification of SLM areas, a Ti/Au (5 nm/15 nm) contact was patterned on the MoS2 flake by photolithography. We used the Photoresist ARP

Challenges in realizing ultraflat materials surfaces

• Takashi Yatsui,
• Wataru Nomura,
• Fabrice Stehlin,
• Olivier Soppera,
• Makoto Naruse and
• Motoichi Ohtsu

Beilstein J. Nanotechnol. 2013, 4, 875–885, doi:10.3762/bjnano.4.99

• involved the fabrication of a nanostripe pattern on TiO2. Direct ArF-laser photopatterning was followed by the application of a sol–gel negative tone photoresist to produce TiO2 nanostructures by using deep-UV (DUV) direct-write imaging [42][43]. Figure 4c and Figure 4f show representative AFM images taken

• at different positions (positions A and B, respectively) of a TiO2 sol–gel photoresist nanostripe corrugation pattern on a Si wafer. DPP etching was performed under CW laser illumination (λ = 532 nm; power density (spatially uniform) 0.28 W·cm−2) and Cl2 gas exposure. Figure 4d and Figure 4f show

Grating-assisted coupling to nanophotonic circuits in microcrystalline diamond thin films

• Patrik Rath,
• Svetlana Khasminskaya,
• Christoph Nebel,
• Christoph Wild and
• Wolfram H.P. Pernice

Beilstein J. Nanotechnol. 2013, 4, 300–305, doi:10.3762/bjnano.4.33

• thick photoresist, which uniformly covers the entire diamond surface and does not leave any peaks unprotected. Here we use the negative-tone electron beam (e-beam) lithography resist Fox15, which is spun onto the prepared wafers to a thickness of 400 nm. After exposure, Fox15 cross-links to a silica

Grain boundaries and coincidence site lattices in the corneal nanonipple structure of the Mourning Cloak butterfly

• Ken C. Lee and
• Uwe Erb

Beilstein J. Nanotechnol. 2013, 4, 292–299, doi:10.3762/bjnano.4.32

• effect, which provides some protection from predators. In recent years many artificial moth-eye-type surfaces have been developed as antireflection, antiglare surfaces by various methods such as photoresist patterning, porous aluminium oxide templating or direct reproduction, e.g., [7][8][9]. With

Functionalization of vertically aligned carbon nanotubes

• Eloise Van Hooijdonk,
• Carla Bittencourt,
• Rony Snyders and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14

• printing and solvent-assisted micromolding techniques. Microcontact printing involves the use of a poly(dimethylsiloxane) (PDMS) stamp with self-assembled monolayer (SAM) coating to print the substrate surface by transfer of the SAM (e.g., alkysiloxane). A photoresist solution is deposited in the areas not

• SWCNTs on regularly patterned silicon with tower-like structures [59] or aligned multiwalled carbon nanotubes [60]. The second method, solvent-assisted micromolding consists of printing a drop of photoresist solution by pressing with a PDMS stamp with a patterned relief structure on its surface. After

• and packing densities on specific regions, with covered and uncovered photoresist films using a photolithographic approach. The surface areas covered and uncovered by the film lead to a difference in the aligned CNTs growth on these two regions and consequently to the formation of 3D aligned carbon

Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

• Britta Kämpken,
• Verena Wulf,
• Norbert Auner,
• Marcel Winhold,
• Michael Huth,
• Daniel Rhinow and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

• ” persisted, reproducing the pattern of the mask (Figure 12, left). Obviously cross-linking occurs during the irradiation, decreasing the solubility of this material (negative photoresist). Annealing of this patterned film for one hour in the presence of air, as described above, left a thin but visible layer

Mapping mechanical properties of organic thin films by force-modulation microscopy in aqueous media

• Jianming Zhang,
• Zehra Parlak,
• Carleen M. Bowers,
• Terrence Oas and
• Stefan Zauscher

Beilstein J. Nanotechnol. 2012, 3, 464–474, doi:10.3762/bjnano.3.53

• , HO(CH2CH2O)3C11H22SH) obtained at 20 kHz. The patterns were prepared by photolithography. Briefly, the sample was prepared by immersing the developed photoresist pattern in a 10 µM thiol solution for 60 s, followed by stripping with ethanol and washing with Milli-Q grade water (see Experimental

• stripping off of the photoresist, and backfilling in 0.5 mM EG3-thiol for 1 h. Both height and friction images do not show any pattern-related contrast, which suggests that the molecules have a similar height and the same surface chemical properties. Importantly, however, the original patterns become

• photoresist stripping), processed in parallel, but without thiol deposition. The height, lateral force, and amplitude and phase images do not show any difference in the morphology or the substrate mechanical properties, suggesting that the photoresist developing and stripping steps did not change the surface

Ultraviolet photodetection of flexible ZnO nanowire sheets in polydimethylsiloxane polymer

• Jinzhang Liu,
• Nunzio Motta and
• Soonil Lee

Beilstein J. Nanotechnol. 2012, 3, 353–359, doi:10.3762/bjnano.3.41

• longer. Previous reports on ZnO nanowires that had gone through a lithography process involving polymers for making the electrodes [18][19][20][21][22], demonstrate a slow UV photoresponse compared to those that had never been in contact with polymers [7][9][10]. Surface contaminations from photoresist

Analysis of fluid flow around a beating artificial cilium

• Mojca Vilfan,
• Gašper Kokot,
• Andrej Vilfan,
• Natan Osterman,
• Blaž Kavčič,
• Igor Poberaj and
• Dušan Babič

Beilstein J. Nanotechnol. 2012, 3, 163–171, doi:10.3762/bjnano.3.16

• manufactured by using a combination of photolithography and etching: First a 200 nm thick nickel layer was deposited on a microscope glass slide by a standard evaporation technique. A layer of negative photoresist (SU-8 2025, Microchem, adhesion promoter TI Prime, Microchemicals GmbH) was spin-coated onto the

• substrate. Direct illumination of the photoresist with an UV laser (Omikron Laserage GmbH, Bluephoton LDM375.20.CWA.L, 375 nm, Zeiss LD Plan-neofluar 10x/0.4 Korr objective) caused cross-linking of SU-8 molecules in the desired pattern [25]. The position of the laser beam was steered by acousto-optic

• deflectors (A.A. Opto-electronic, DTSXY-400-405) and a beam-steering controller (Aresis, d.o.o., BSC-160). After the photoresist was developed, the sample was ashed in post-glow oxygen plasma for 60 s and hard baked at 200 °C, leaving an SU-8 dot-array structure on nickel-covered glass. The slide was dipped

Self-assembled monolayers and titanium dioxide: From surface patterning to potential applications

• Yaron Paz

Beilstein J. Nanotechnol. 2011, 2, 845–861, doi:10.3762/bjnano.2.94

• possible under exposure to 185 nm light [59], it is limited to specific functional groups, under constrained environments. In contrast, SAMs located on titanium dioxide can be patterned quite easily by photocatalysis (Figure 3A). There is no need for a photoresist, and a standard patterning mask can be

Tip-enhanced Raman spectroscopic imaging of patterned thiol monolayers

• Johannes Stadler,
• Thomas Schmid,
• Lothar Opilik,
• Phillip Kuhn,
• Petra S. Dittrich and
• Renato Zenobi

Beilstein J. Nanotechnol. 2011, 2, 509–515, doi:10.3762/bjnano.2.55

• 650 μm wide hexagons, filled with flat circles of decreasing size (from top to bottom) and decreasing surface coverage (from left to right). The height of the elevated features of the stamp is defined by the thickness of the photoresist on the master (2.1 ± 0.1 μm). The master for microcontact

Aerosol assisted fabrication of two dimensional ZnO island arrays and honeycomb patterns with identical lattice structures

• Mitsuhiro Numata and
• Yoshihiro Koide

Beilstein J. Nanotechnol. 2010, 1, 71–74, doi:10.3762/bjnano.1.9

• -dimensional photonic crystals (PhCs) [7][8][9]. To this end, a number of techniques, including an atomic layer epitaxy [10], chemical vapor deposition [11], and photoresist patterning [12][13], have been used to deposit various morphologies of ZnO patterns on substrates. There is intense current interest in