Formation of precise 2D Au particle arrays via thermally induced dewetting on pre-patterned substrates

• Dong Wang,
• Ran Ji and
• Peter Schaaf

Beilstein J. Nanotechnol. 2011, 2, 318–326, doi:10.3762/bjnano.2.37

• induced by annealing. Two types of pre-patterned substrates were used: The first comprised an array of pyramidal pits and the second an array of circular holes. For the dewetting of Au films on the pyramidal pit substrate, the structural curvature-driven diffusion cooperates with capillarity-driven

• crystallographic orientation, on a substrate with an array of periodic pits, via solid-state dewetting induced by annealing at 850 °C [9]. Our previous work showed that a pre-patterned substrate with deep grid grooves can also lead to the formation of a 2D ordered Au nanoparticle array via dewetting induced by

• . induced by annealing, has been studied, on both the flat substrate and two types of pre-patterned substrates (one with an array of pyramidal pits and one with an array of circular holes, made using nanoimprint lithography), and large areas of 2D ordered nanoparticle arrays were fabricated. Instead of the

Manipulation of gold colloidal nanoparticles with atomic force microscopy in dynamic mode: influence of particle–substrate chemistry and morphology, and of operating conditions

• Samer Darwich,
• Karine Mougin,
• Akshata Rao,
• Enrico Gnecco,
• Shrisudersan Jayaraman and
• Hamidou Haidara

Beilstein J. Nanotechnol. 2011, 2, 85–98, doi:10.3762/bjnano.2.10

• (FIB) milling technique. The width and depth of the pits are 650 nm and 5 nm, respectively, and the spacing between two adjacent pits is 125 nm. On the patterned surface, the mean direction of motion remains identical (on average), even after a long acquisition time. This stability of the direction of

• the particle movement observed here on the nanopatterned substrates can be attributed to "self-cleaning" of the tip when it crosses the shallow pits. Considering that the pits have only a small influence on the particle direction (Figure 9), which means that all the particles follow the same direction

• deposited onto a silicon wafer. (a) Ordered organization as described in the Experimental section, (b) random distribution. Frame sizes: 3 µm and 1 µm, respectively. As-synthesized Au particles on silicon in ultra-high vacuum. Frame size: 3 µm. AFM image of nanopatterned surface exhibiting Si pits: Frame

The description of friction of silicon MEMS with surface roughness: virtues and limitations of a stochastic Prandtl–Tomlinson model and the simulation of vibration-induced friction reduction

• W. Merlijn van Spengen,
• Viviane Turq and
• Joost W. M. Frenken

Beilstein J. Nanotechnol. 2010, 1, 163–171, doi:10.3762/bjnano.1.20

• simulation replicates even the fact that a vibrational amplitude with the frequency of the modulation is visible in the lateral force at high modulation amplitudes (‘wobbling in the pits’), and that its envelope has a correlation with the surface roughness. Only in the simulation these effects are smaller