Beilstein J. Nanotechnol.2011,2, 509–515, doi:10.3762/bjnano.2.55
printing stamps was fabricated by standard photolithography [14][38][39]. Briefly, a positive resist (AZ1518) was spin-coated to a height of 2.1 ± 0.1 μm onto a silicon wafer, exposed through a sub-micrometer resolution chrome mask and developed. After overnight silanization, poly(dimethylsiloxane) (PDMS
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Figure 1:
(a), (c) 30/10 μm AFM tapping mode phase images of microcontact printed 2-PySH on a gold surface. (...