Thickness-modulated tungsten–carbon superconducting nanostructures grown by focused ion beam induced deposition for vortex pinning up to high magnetic fields

• Ismael García Serrano,
• Javier Sesé,
• Isabel Guillamón,
• Hermann Suderow,
• Sebastián Vieira,
• Manuel Ricardo Ibarra and
• José María De Teresa

Beilstein J. Nanotechnol. 2016, 7, 1698–1708, doi:10.3762/bjnano.7.162

• Materiales de Aragón (ICMA), CSIC - Universidad de Zaragoza, 50009 Zaragoza, Spain 10.3762/bjnano.7.162 Abstract We report efficient vortex pinning in thickness-modulated tungsten–carbon-based (W–C) nanostructures grown by focused ion beam induced deposition (FIBID). By using FIBID, W–C superconducting

• pinning potentials, maximizing the opportunities for the investigation of fundamental aspects in vortex science under changing external stimuli (e.g., temperature, magnetic field, electrical current). Keywords: focused ion beam induced deposition; magnetotransport; superconductivity; vortex lattice

• ] and insertion of structural defects [35][37][43] are other common pinning strategies. The use of a focused ion beam (FIB) for enhanced vortex pinning through local removal of the superconducting material has been explored as well [40][42][46][47][48]. In contrast to our approach followed here, such

Nano- and microstructured materials for in vitro studies of the physiology of vascular cells

• Alexandra M. Greiner,
• Adria Sales,
• Hao Chen,
• Sarah A. Biela,
• Dieter Kaufmann and
• Ralf Kemkemer

Beilstein J. Nanotechnol. 2016, 7, 1620–1641, doi:10.3762/bjnano.7.155

• lithography [66]), etching (focused-ion beam [67] and electron-beam nanolithography [68]), electrical (electrospinning [69][70][71][72]), mechanical (nanoskiving [46][73], nanoimprint lithography [66]) and colloidal (colloidal lithgraphy [74][75]) are given here. Nanoscale optical photolithography takes

• techniques [76]. In UV-NIL, the mold is brought into contact with a wafer previously coated with photoresist and solidified with UV light. A resolution of 30 nm can be achieved [77]. Focused-ion beam nanolithography relies on a beam of ions to locally modify a surface coating, to mill a substrate or to

• focused-ion beam nanolithography it is also possible to deposit materials. The desired material to deposit is in the gas phase and it is let to adsorb on the surface. Afterwards, the ion beam decomposes the adsorbed molecules into a volatile component and a non-volatile component. The non-volatile

Graphene-enhanced plasmonic nanohole arrays for environmental sensing in aqueous samples

• Christa Genslein,
• Peter Hausler,
• Eva-Maria Kirchner,
• Rudolf Bierl,
• Antje J. Baeumner and
• Thomas Hirsch

Beilstein J. Nanotechnol. 2016, 7, 1564–1573, doi:10.3762/bjnano.7.150

• arrays have been first fabricated 1995 by Masuda and Fukuda using a replication process of an anodized alumina structure [23]. Since then, a vast number of techniques has been invented. For example, as focused ion beam (FBI) milling allows a control of the size and shape of the nanoholes with good

Customized MFM probes with high lateral resolution

• Óscar Iglesias-Freire,
• Miriam Jaafar,
• Eider Berganza and
• Agustina Asenjo

Beilstein J. Nanotechnol. 2016, 7, 1068–1074, doi:10.3762/bjnano.7.100

• , either by using focused ion beam (FIB) milled tips [1][2], electron beam deposited tips [3][4] or stencil-deposited metal dots onto an AFM tip [5]. Following a different approach, probes with carbon nanotubes (CNTs) have been fabricated for MFM imaging either by mechanical attachment [6][7][8] or direct

Signal enhancement in cantilever magnetometry based on a co-resonantly coupled sensor

• Julia Körner,
• Christopher F. Reiche,
• Thomas Gemming,
• Bernd Büchner,
• Gerald Gerlach and
• Thomas Mühl

Beilstein J. Nanotechnol. 2016, 7, 1033–1043, doi:10.3762/bjnano.7.96

• (≈10−5 mbar). First, the cantilever was shortened via focused ion beam milling to increase its resonance frequency. This step also increased the stiffness of the cantilever to about 133.8 N/m (see Table 1) which is rather high compared to typical values in cantilever magnetometry. In a second step, an

Large-scale fabrication of achiral plasmonic metamaterials with giant chiroptical response

• Morten Slyngborg,
• Yao-Chung Tsao and
• Peter Fojan

Beilstein J. Nanotechnol. 2016, 7, 914–925, doi:10.3762/bjnano.7.83

• beam lithography or focused ion beam milling, which both are expensive and time consuming methods. Large-scale fabrication of PCMs have been attempted to some degree applying different approaches such as glancing angle deposition [28], scaffold ornamentation [29][30], individual chiral nanoparticles

• CD response at = 0° has also been observed by ECMs produced with focused ion beam milling [13]. The ECM property that allows for the measurement of the enantiomeric structures from one sample, yields several advantages over PCMs in biosensor applications: 1) PCMs require fabrication of the two

• broad signal [13]. This is presumably related to the heterogeneity and 3D nature of the ECM structures, which is less dominant in the hole arrays fabricated by focused ion beam lithography. In spite of this, the CD linewidths of the present ECMs are comparable to those of gammadion PCMs, which have been

Magnetic switching of nanoscale antidot lattices

• Ulf Wiedwald,
• Joachim Gräfe,
• Kristof M. Lebecki,
• Maxim Skripnik,
• Felix Haering,
• Gisela Schütz,
• Paul Ziemann,
• Eberhard Goering and
• Ulrich Nowak

Beilstein J. Nanotechnol. 2016, 7, 733–750, doi:10.3762/bjnano.7.65

• – into thin films. Such antidots act as an inner surface of the materials leading to strong variations of optical [1][2], electrical [3][4], superconducting [5][6], or magnetic properties [7]. Nowadays, top-down approaches like e-beam lithography [8][9] or focused ion beam milling (FIB) [10] and bottom

Cantilever bending based on humidity-actuated mesoporous silica/silicon bilayers

• Christian Ganser,
• Gerhard Fritz-Popovski,
• Roland Morak,
• Parvin Sharifi,
• Benedetta Marmiroli,
• Barbara Sartori,
• Heinz Amenitsch,
• Thomas Griesser,
• Christian Teichert and
• Oskar Paris

Beilstein J. Nanotechnol. 2016, 7, 637–644, doi:10.3762/bjnano.7.56

• actuation experiment was prepared with focused ion beam (FIB) cutting using an AURIGA Crossbeam Workstation (Zeiss). Scanning electron microscopy (SEM) images of the sample cross-section were taken with the same instrument with the electron microscope operated at a voltage of 2 keV. GISAXS: measurements and

Near-field visualization of plasmonic lenses: an overall analysis of characterization errors

• Jing Wang,
• Yongqi Fu,
• Zongwei Xu and
• Fengzhou Fang

Beilstein J. Nanotechnol. 2015, 6, 2069–2077, doi:10.3762/bjnano.6.211

• elliptical slits. The focusing performance of the structures was studied before [22]. The structures can be fabricated and measured by using focused ion beam (FIB) direct writing technique and near-field scanning optical microscope (NSOM) respectively, as shown in Figure 1. However, from the point of view of

• . For FIB patterning, the inherent astigmatism will exist to a certain extent no matter how finely the operator calibrates the stigmation. Stigmation causes excessive overlapping of the focused ion beam spot along long-axis. Sometime, the overlap can be as large as 90% which is obviously too large for

Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte

• Sanghoon Ji,
• Waqas Hassan Tanveer,
• Wonjong Yu,
• Sungmin Kang,
• Gu Young Cho,
• Sung Han Kim,
• Jihwan An and
• Suk Won Cha

Beilstein J. Nanotechnol. 2015, 6, 1805–1810, doi:10.3762/bjnano.6.184

• deposited on BECs with different thicknesses, whose cross-sectional microstructure was investigated by focused ion beam and field emission scanning electron microscopy (FIB/FE-SEM) imaging: the BECs were 40 nm and 320 nm in thickness. In case of the thinner BEC, a significant amount of ALD YSZ certainly

• -deposited (ALD) yttria-stabilized zirconia (YSZ) electrolyte and 60 nm-thick top electrode catalyst (sputtered porous Pt cathode). (A) Focused ion beam-prepared field emission scanning electron microscopy (FE-SEM) cross-sectional images for 50 nm-thick ALD YSZ films deposited on 80 nm pore AAO supported 40

Current–voltage characteristics of manganite–titanite perovskite junctions

• Benedikt Ifland,
• Patrick Peretzki,
• Birte Kressdorf,
• Philipp Saring,
• Andreas Kelling,
• Michael Seibt and
• Christian Jooss

Beilstein J. Nanotechnol. 2015, 6, 1467–1484, doi:10.3762/bjnano.6.152

• acceleration voltages did not result in measureable EBIC in our setup. A cross-section lamella of the sample was prepared by means of a focused ion beam microscope. An EBIC scan across the p–n interface is shown in Figure 3b, together with a simulated EBIC linescan, taking into account only the generation

Scalable, high performance, enzymatic cathodes based on nanoimprint lithography

• Dmitry Pankratov,
• Richard Sundberg,
• Javier Sotres,
• Dmitry B. Suyatin,
• Ivan Maximov,
• Sergey Shleev and
• Lars Montelius

Beilstein J. Nanotechnol. 2015, 6, 1377–1384, doi:10.3762/bjnano.6.142

• taken using a Nova NanoLab 600 Dual Beam focused ion beam and scanning electron microscope (FIB-SEM) from FEI Company (Hillsboro, Oregon, USA). The images were taken with an immersion lens at an acceleration voltage of 30 kV and a beam current of 2.4 nA. AFM images were obtained using a Multimode VIII

Structural transitions in electron beam deposited Co–carbonyl suspended nanowires at high electrical current densities

• Gian Carlo Gazzadi and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2015, 6, 1298–1305, doi:10.3762/bjnano.6.134

• Strata DB235M) combining a Ga-ion focused ion beam (FIB) with a thermal field emission SEM, equipped with a Co–carbonyl (Co2(CO)8) GIS operated at room temperature (RT). The GIS is mounted at a polar angle of 52° and an azimuthal angle of 115° with respect to the sample surface. An injection nozzle with

Magnetic properties of iron cluster/chromium matrix nanocomposites

• Arne Fischer,
• Robert Kruk,
• Di Wang and
• Horst Hahn

Beilstein J. Nanotechnol. 2015, 6, 1158–1163, doi:10.3762/bjnano.6.117

• energy-filtered transmission electron microscopy (EFTEM) and scanning transmission electron microscopy (STEM) micrographs of the Fe distribution for a 10 vol % Fe1000/Cr sample, specifically prepared for TEM. To avoid subsequent focused ion beam cutting and possible oxidation, the sample was deposited on

Patterning technique for gold nanoparticles on substrates using a focused electron beam

• Takahiro Noriki,
• Shogo Abe,
• Kotaro Kajikawa and
• Masayuki Shimojo

Beilstein J. Nanotechnol. 2015, 6, 1010–1015, doi:10.3762/bjnano.6.104

• structures with gold and silver nanoparticles using a nanomanipulator. This technique is fascinating, but it may be a time-consuming process for production of relatively large circuits. Nanostructures have also been fabricated using focused ion beam- or focused electron beam-induced deposition [1][7

Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

• Brett B. Lewis,
• Michael G. Stanford,
• Jason D. Fowlkes,
• Kevin Lester,
• Harald Plank and
• Philip D. Rack

Beilstein J. Nanotechnol. 2015, 6, 907–918, doi:10.3762/bjnano.6.94

• grown to a thickness of ca. 400 nm and subsequently purified at 25 °C at various times from 1 to 12 min. After curing, the pads were sectioned using gallium focused ion beam milling to reveal the Pt layer thickness as a function of purification time. The SEM micrographs in Figure 2 depict the bright

• parameters during deposition. As the layer is extremely thin (a few monolayers) it can also be easily removed ex situ by with a brief focused ion beam etch. Microstructure Transmission electron microscopy (TEM) images of the as-deposited and cured PtCx EBID patterns were taken to compare the microstructure

Hollow plasmonic antennas for broadband SERS spectroscopy

• Gabriele C. Messina,
• Mario Malerba,
• Pierfrancesco Zilio,
• Ermanno Miele,
• Michele Dipalo,
• Lorenzo Ferrara and
• Francesco De Angelis

Beilstein J. Nanotechnol. 2015, 6, 492–498, doi:10.3762/bjnano.6.50

• in depth [23]. Briefly, a layer of optical resist (Shipley S1813) is deposited by spin coating on the top of a silicon nitride membrane. The structure of the antenna is defined from the backside of the membrane by focused ion beam milling (FEI, NanoLab 600 dual beam system) using a gallium ion source

A scanning probe microscope for magnetoresistive cantilevers utilizing a nested scanner design for large-area scans

• Tobias Meier,
• Alexander Förste,
• Ali Tavassolizadeh,
• Karsten Rott,
• Dirk Meyners,
• Roland Gröger,
• Günter Reiss,
• Eckhard Quandt,
• Thomas Schimmel and
• Hendrik Hölscher

Beilstein J. Nanotechnol. 2015, 6, 451–461, doi:10.3762/bjnano.6.46

• focused ion beam and electron beam deposition, tips can be manually been grown on the apex of the cantilever [59]. The use of such tips enables high lateral resolution as tip radii as small as 30 nm can be achieved. The advantage of this approach is that the tip is subsequently grown and without altering

• different angles of the bias field towards the easy axis. The bias field has a strong influence on the strain sensitivity of the TMR sensor. a) To improve lateral resolution, tips with a tip radius of 30 nm were grown by a combination of focused ion beam and electron beam deposition deposition. b) Atomic

Electrical properties of single CdTe nanowires

• Elena Matei,
• Camelia Florica,
• Andreea Costas,
• María Eugenia Toimil-Molares and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2015, 6, 444–450, doi:10.3762/bjnano.6.45

• . Focused ion beam-induced metallization was used to produce individual nanowires with electrical contacts and electrical measurements were performed on these individual nanowires. The influence of a bottom gate was investigated and it was found that surface passivation leads to improved transport

• combination of lithography and focused ion beam-induced metallization (FIBIM). The electrical properties were determined for individual nanowires prepared under different conditions. Further, the effect of a bottom gate on the charge carriers transported through the nanowire channel was examined. It was also

Nanoporous Ge thin film production combining Ge sputtering and dopant implantation

• Jacques Perrin Toinin,
• Alain Portavoce,
• Khalid Hoummada,
• Michaël Texier,
• Maxime Bertoglio,
• Sandrine Bernardini,
• Marco Abbarchi and
• Lee Chow

Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32

• for the fabrication of nanocrystals by dewetting, such as metals or semiconductors. In addition, the structure of the dewetted layers can be controlled using several techniques such as pulsed laser annealing [35][36] or a substrate patterned by focused ion beam. The study of Ge dewetting on SiO2 [37

Bright photoluminescence from ordered arrays of SiGe nanowires grown on Si(111)

• D. J. Lockwood,
• N. L. Rowell,
• A. Benkouider,
• A. Ronda,
• L. Favre and
• I. Berbezier

Beilstein J. Nanotechnol. 2014, 5, 2498–2504, doi:10.3762/bjnano.5.259

• in the substrate by focused ion beam patterning for the preferential nucleation and growth of these well-organized NWs. The NWs thus produced have a diameter of 200 nm, a length of 200 nm, and a Ge concentration x = 0.15. Their photoluminescence (PL) spectra were measured at low temperatures (from 6

• positioned [28]. We have evolved an efficient and simple electrochemical process that joins focused-ion-beam (FIB) lithography and galvanic reaction to selectively prepare gold nanoparticles in well-defined locations. Afterwards these nanoparticles are used for the molecular beam epitaxy (MBE) growth of

PVP-coated, negatively charged silver nanoparticles: A multi-center study of their physicochemical characteristics, cell culture and in vivo experiments

• Sebastian Ahlberg,
• Alexandra Antonopulos,
• Jörg Diendorf,
• Ralf Dringen,
• Matthias Epple,
• Rebekka Flöck,
• Wolfgang Goedecke,
• Christina Graf,
• Nadine Haberl,
• Jens Helmlinger,
• Fabian Herzog,
• Frederike Heuer,
• Stephanie Hirn,
• Christian Johannes,
• Stefanie Kittler,
• Manfred Köller,
• Katrin Korn,
• Wolfgang G. Kreyling,
• Fritz Krombach,
• Jürgen Lademann,
• Kateryna Loza,
• Eva M. Luther,
• Marcelina Malissek,
• Martina C. Meinke,
• Daniel Nordmeyer,
• Anne Pailliart,
• Jörg Raabe,
• Fiorenza Rancan,
• Barbara Rothen-Rutishauser,
• Eckart Rühl,
• Carsten Schleh,
• Andreas Seibel,
• Christina Sengstock,
• Lennart Treuel,
• Annika Vogt,
• Katrin Weber and
• Reinhard Zellner

Beilstein J. Nanotechnol. 2014, 5, 1944–1965, doi:10.3762/bjnano.5.205

• dissolution process in cells (including the localization of low concentrations of small nanoparticles as well as silver ions) imaging at the Ag L3,2 edges is a promising option for future work. Focused ion beam (FIB) and optical microscopy (phase contrast microscopy; fluorescence microscopy; confocal laser

• reveal any formation of silver agglomerates (Figure 6A). In order to prove that the silver agglomerates are located inside the cells, focused ion beam milling (FIB) was applied which permits the view on cross sections of various materials by a beam of high-energy gallium ions [77][78]. After culturing

Patterning a hydrogen-bonded molecular monolayer with a hand-controlled scanning probe microscope

• Matthew F. B. Green,
• Taner Esat,
• Christian Wagner,
• Philipp Leinen,
• Alexander Grötsch,
• F. Stefan Tautz and
• Ruslan Temirov

Beilstein J. Nanotechnol. 2014, 5, 1926–1932, doi:10.3762/bjnano.5.203

• used a qPlus sensor [17] manufactured by CREATEC. The AFM/STM tip was made from a 0.3 mm long and 15 μm thick PtIr wire glued to the tuning fork of the qPlus sensor, and sharpened with a gallium focused ion beam (FIB). The resulting resonance frequency of the qPlus sensor was f0 = 30,300 Hz with a

Nanocrystalline ceria coatings on solid oxide fuel cell anodes: the role of organic surfactant pretreatments on coating microstructures and sulfur tolerance

• Chieh-Chun Wu,
• Ling Tang and
• Mark R. De Guire

Beilstein J. Nanotechnol. 2014, 5, 1712–1724, doi:10.3762/bjnano.5.181

• same procedures as for the nickel-GDC anodes. Then cross-sections were prepared by using a focused ion beam unit, and EDXS maps were superimposed on the cross-sectional images (Figure 6). With YSZ replacing the GDC as the ionically conducting phase in the anode, the ceria coating could easily be

• obtained by using the focused ion beam unit of the Nova Nanolab. Output voltage and ASR at low current density, showing sulfur tolerance. Yellow shading denotes 24 h periods of H2S exposure in the anode stream at the concentration indicated. (Treatment-1 cell (no ceria coating) with no interlayer.) Output

Probing the electronic transport on the reconstructed Au/Ge(001) surface

• Franciszek Krok,
• Mark R. Kaspers,
• Alexander M. Bernhart,
• Marek Nikiel,
• Benedykt R. Jany,
• Paulina Indyka,
• Mateusz Wojtaszek,
• Rolf Möller and
• Christian A. Bobisch

Beilstein J. Nanotechnol. 2014, 5, 1463–1471, doi:10.3762/bjnano.5.159

• source software GSxM [17] and data processing was done by using WxSM [18]. For the transmission electron microscope (TEM) measurements lamellas of the Au/Ge(001) of the very same sample were prepared with the use of an FEI Quanta 3D FEG scanning electron microscope equipped with a 30 keV Ga+ focused ion

• beam gun (FIB). In order to preserve the surface of the Au/Ge sample against the standard FIB operation during the lamella preparation, the sample surface at first was covered (capped) with a 20 nm layer of thermally evaporated carbon. Then, on top of the cap layer, a platinum layer was deposited using