An iridescent film of porous anodic aluminum oxide with alternatingly electrodeposited Cu and SiO₂ nanoparticles

• Menglei Chang,
• Huawen Hu,
• Haiyan Quan,
• Hongyang Wei,
• Zhangyi Xiong,
• Jiacong Lu,
• Pin Luo,
• Yaoheng Liang,
• Jianzhen Ou and
• Dongchu Chen

Beilstein J. Nanotechnol. 2019, 10, 735–745, doi:10.3762/bjnano.10.73

• of the fabrication of an iridescent film of porous AAO on an industrial aluminum alloy substrate, with alternatingly electrodeposited Cu and SiO2 nanoparticles (NPs). A rainbow effect was effectively obtained for the optimized sample with appropriate alternating electrodeposition times. The structure

• and optical properties of a series of the electrodeposited AAO-based thin film were investigated. The Cu and SiO2 NPs were found to be uniformly deposited into the porous structure of the AAO film, and the alternating electrodeposition repeating twice led to the formation of the optimal AAO-based thin

• -area, ordered interference-enabled colored films with uniform structural colors on the surface of inorganic nanoparticles (NPs) that had been prepared to bear surface charges [28]. On the substrates of quartz glass, PET and PP, twenty cycles of the assembly of a SiO2 film led to the formation of dark

Choosing a substrate for the ion irradiation of two-dimensional materials

• Egor A. Kolesov

Beilstein J. Nanotechnol. 2019, 10, 531–539, doi:10.3762/bjnano.10.54

• defect formation mechanisms. The estimations include Monte Carlo simulations for He, Ar, Xe, C, N and Si ions, performed in the incident ion energy range from 100 eV to 250 MeV. Cu, SiO2, SiC and Al2O3 substrates were analyzed. The considered substrate-related defect formation mechanisms are sputtering

• Transport of Ions in Matter (TRIM) simulations using 160 MeV Xe ions for the irradiation of graphene on Cu, SiO2/Si and glass leads to negligible overall participation of substrate sputtering and a stronger (but small) role of the substrate recoils. Besides, it was noted that hot electrons generated in the

• taking the substrate effects into account. The analysis was performed for the most common ions used for monolayer irradiation: He, Ar, Xe, C, N and Si; the chosen substrates include Cu, SiO2, SiC and Al2O3. Copper is a widely available metal and is traditionally used as a substrate in 2D material science

A porous 3D-RGO@MWCNT hybrid material as Li–S battery cathode

• Yongguang Zhang,
• Jun Ren,
• Yan Zhao,
• Taizhe Tan,
• Fuxing Yin and
• Yichao Wang

Beilstein J. Nanotechnol. 2019, 10, 514–521, doi:10.3762/bjnano.10.52

• sulfur loading is essential for the practical implementation of Li–S batteries [5][6][7]. To overcome the above-mentioned challenges in Li–S batteries, many strategies have been proposed [8][9][10][11][12]. For example, metal oxides, such as TiO2, ZnO, MnO2, and SiO2, were reported to provide active

• The synthesis of the 3D-RGO@MWCNT composite is illustrated in Figure 1, highlighting the 3D porous RGO structure and the MWCNT lattice matrix. The SEM images confirmed that the precursor composite, RGO@MWCNT@SiO2, contained 200–300 nm SiO2 particles that were successfully encased by RGO and MWCNTs

• (Figure 2a). After HF etching, a 3D-RGO@MWCNT was obtained (Figure 2b,c). The porous spherical indents (ca. 200 nm) remained after the removal of SiO2 (Figure 3a). Furthermore, after sulfur loading, both SEM (Figure 2d) and TEM (Figure 3b) images revealed that the structure remained in the resulting S-3D

Nanocomposite–parylene C thin films with high dielectric constant and low losses for future organic electronic devices

• Marwa Mokni,
• Gianluigi Maggioni,
• Abdelkader Kahouli,
• Sara M. Carturan,
• Walter Raniero and
• Alain Sylvestre

Beilstein J. Nanotechnol. 2019, 10, 428–441, doi:10.3762/bjnano.10.42

• other pure materials such as SiO2, polyimide, polyethylene, alumina (Al2O3), benzocyclobutenes (BCB) and SiO2/poly(methyl methacrylate) (PMMA), nanocomposite parylene C (NCPC) exhibits some interesting properties [39][40][41][42][43][44][45][46][47]. As an example, parylene C/Silica nanocomposites show

Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO₂ nanorods

• Julian Kalb,
• Vanessa Knittel and
• Lukas Schmidt-Mende

Beilstein J. Nanotechnol. 2019, 10, 412–418, doi:10.3762/bjnano.10.40

• done in argon (20 sccm) at a pressure of 6.7 × 10−3 mbar. Subsequently, the sample was annealed at 850 °C in oxygen (500 sccm) for 2 h resulting in a polycrystalline anatase TiO2 film. Optionally, an additional 3 nm thin SiO2 layer was placed on the anatase film with RC sputter deposition. Scanning

• was not observed that different probes result in changes of the presented structure. Last but not least, a look at the penetration depth of this method is taken. For this purpose, a 3 nm thin SiO2 layer was deposited on the anatase film. Even after scratching hundreds of times at the same position

• anatase film. In addition, silicon nanoparticles being scraped off the AFM tip might act as nucleation sites such as other dirt particles appearing in the growth solution. However, the absence of nanorods on SiO2 indicates that the growth of rutile nanorods is not triggered by silicon nanoparticles. It

Integration of LaMnO_3+δ films on platinized silicon substrates for resistive switching applications by PI-MOCVD

• Raquel Rodriguez-Lamas,
• Dolors Pla,
• Odette Chaix-Pluchery,
• Benjamin Meunier,
• Fabrice Wilhelm,
• Andrei Rogalev,
• Laetitia Rapenne,
• Xavier Mescot,
• Quentin Rafhay,
• Hervé Roussel,
• Michel Boudard,
• Carmen Jiménez and
• Mónica Burriel

Beilstein J. Nanotechnol. 2019, 10, 389–398, doi:10.3762/bjnano.10.38

• , maximizing the flux of carried precursor. The deposition temperature inside the main chamber (a hot-wall quartz reactor heated by an external furnace) ranged from 500 to 750 °C. The substrates used were 1 cm × 1 cm chips cut from a Pt (150 nm)/TiO2 (40 nm)/SiO2 (500 nm)/Si (111) wafer (VinKarola Instruments

Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices

• Eduardo Nery Duarte de Araujo,
• Thiago Alonso Stephan Lacerda de Sousa,
• Luciano de Moura Guimarães and
• Flavio Plentz

Beilstein J. Nanotechnol. 2019, 10, 349–355, doi:10.3762/bjnano.10.34

• . Experimental We made use of CVD graphene on top of a 300 nm thick SiO2 layer, which was purchased from Graphene Platform. The graphene devices were produced in the field-effect transistor configuration (GFET) in two photolithography steps (Figure 1). The first step was employed for defining the graphene device

Development of an anti-pollution coating process technology for the application of an on-site PV module

• Sejin Jung,
• Wonseok Choi,
• Jung Hyun Kim and
• Jang Myoun Ko

Beilstein J. Nanotechnol. 2019, 10, 332–336, doi:10.3762/bjnano.10.32

• -pollution characteristics of the PV modules contained silicon dioxide (SiO2), lithium (Li), and potassium (K). The viscosity, density, and specific gravity (referring to the density of water) of the coating solution were 0.01–0.03 kg/m·s, 1.1 g/cm3, and 1.13 ± 0.05, respectively. The solution can be used to

Interaction of Te and Se interlayers with Ag or Au nanofilms in sandwich structures

• Arkadiusz Ciesielski,
• Lukasz Skowronski,
• Marek Trzcinski,
• Ewa Górecka,
• Wojciech Pacuski and
• Tomasz Szoplik

Beilstein J. Nanotechnol. 2019, 10, 238–246, doi:10.3762/bjnano.10.22

• of developed voids, which is linked with the density profile, may strongly influence the segregation characteristics. Here, we report on XRD and XRR measurements to investigate the crystallinity of Ag and Au nanolayers deposited on SiO2 substrates with 2 nm-thick Te or Se interlayers. XPS allowed us

• metal films Table 1 shows the XRD-derived average grain size and lattice constant values of 35 nm-thick silver and gold layers deposited on SiO2 substrates with 2 nm-thick Te and Se interlayers, while Figure 1 shows the XRR spectra and extracted density profiles of these multilayers. Neither Te nor Se

• are good wetting films for silver and gold. Although the plasmonic layers deposited on Te films have their grains size decreased, the XRR extracted layer density profiles show that the density of a layer increases with increasing distance from the SiO2/metal interface, which is the opposite of the

Study of silica-based intrinsically emitting nanoparticles produced by an excimer laser

• Imène Reghioua,
• Mattia Fanetti,
• Sylvain Girard,
• Diego Di Francesca,
• Simonpietro Agnello,
• Layla Martin-Samos,
• Marco Cannas,
• Matjaz Valant,
• Melanie Raine,
• Marc Gaillardin,
• Nicolas Richard,
• Philippe Paillet,
• Aziz Boukenter,
• Youcef Ouerdane and
• Antonino Alessi

Beilstein J. Nanotechnol. 2019, 10, 211–221, doi:10.3762/bjnano.10.19

• plate that was preheated to 60 °C. The grids were supported by an aluminium stub for SEM/EDX/CL characterization. Sample A (SiO2+Ge, 33 mJ/pulse); a) SEM image of an agglomerate/aggregate of nanoparticles, inset zoom of the square 1; b) SEM image of a small group of nanoparticles; c), d) and e) EDX

• mapping of the Si Kα1, Ge Lα1,2 and O Kα1 lines, respectively, recorded in the zone indicated as square 1 in panel a. Sample A (SiO2+Ge, 33 mJ/pulse); a) SEM image of the zone indicated as square 2 in Figure 1a; b) CL panchromatic map of the same region; c) CL spectrum recorded in the zone marked by the

• red square in panel a. Sample A (SiO2+Ge, 33 mJ/pulse); a) TEM image of the region labeled 1 in Figure 1a; b) details of the red square of panel a; c) image of nanoparticles with different sizes; d) details of the red square of panel b; e) STEM image of a single, large nanoparticle; f) STEM image of

Uniform Sb₂S₃ optical coatings by chemical spray method

• Jako S. Eensalu,
• Atanas Katerski,
• Erki Kärber,
• Ilona Oja Acik,
• Arvo Mere and
• Malle Krunks

Beilstein J. Nanotechnol. 2019, 10, 198–210, doi:10.3762/bjnano.10.18

• islands indicative of Volmer–Weber growth in Sb2S3 layers deposited on Si/SiO2 alternative substrates by ultrasonic spraying (Supporting Information File 1, Figure S10A,B). Metastibnite-Sb2S3 forms when formation of stibnite-Sb2S3 is halted by insufficient reaction time and energy [44][45][46]. Volmer

Mechanism of silica–lysozyme composite formation unravelled by in situ fast SAXS

• Tomasz M. Stawski,
• Daniela B. van den Heuvel,
• Rogier Besselink,
• Dominique J. Tobler and
• Liane G. Benning

Beilstein J. Nanotechnol. 2019, 10, 182–197, doi:10.3762/bjnano.10.17

• inorganic nanoparticles (NPs) and proteins in aqueous media is of paramount interest for colloid chemistry. In particular, the interactions between silica (SiO2) NPs and lysozyme (LZM) have attracted attention, because LZM is well-known to adsorb strongly to silica NPs, while at the same time preserving its

• interactions are the key to understand the crystallisation of biominerals in living organisms (e.g., in bone formation), and to manufacture better functional materials [11][12][13][14][15]. In particular, composites of amorphous silica (SiO2) nanoparticles (NPs) and lysozyme (LZM) have attracted attention

• bridge between silica NPs, leading to aggregation and flocculation and thus to large silica NP–LZM composites. In the SiO2–LZM model system, a number of studies investigating the relationship between silica NP sizes, and adsorption modes of lysozyme revealed a correlation between composite properties and

pH-mediated control over the mesostructure of ordered mesoporous materials templated by polyion complex micelles

• Emilie Molina,
• Mélody Mathonnat,
• Jason Richard,
• Patrick Lacroix-Desmazes,
• Martin In,
• Philippe Dieudonné,
• Thomas Cacciaguerra,
• Corine Gérardin and
• Nathalie Marcotte

Beilstein J. Nanotechnol. 2019, 10, 144–156, doi:10.3762/bjnano.10.14

• 900 °C. The mass percentage of silica (% mass(SiO2)) was calculated from the residual mass at 900 °C. The EA of the hybrid materials was performed on an Interscience Flash EA 1112 series (Thermo Finnigan) instrument. The value of the mass percentage of OC (% mass (OC)) in the hybrid materials, %N

• ) of the as-synthesized silica network was determined by 29Si MAS-NMR spectroscopy using a Varian VNMRS 300MHz spectrometer. The typical Q4, Q3 and Q2 signals appearing respectively at −110 ppm (SiO2), −100 ppm (SiO3/2) and −90 ppm (SiO(OH)2) were deconvoluted, and the areas were used for calculating D

• the extent of electrostatic complexation and hydrogen bonding, were determined from the chemical mass compositions of DHBC (wt % DHBC), oligochitosan (OC) (wt % OC) and silica (wt % SiO2) obtained by elemental analysis and thermogravimetric data after drying of the hybrid materials. The silica

Sputtering of silicon nanopowders by an argon cluster ion beam

• Xiaomei Zeng,
• Vasiliy Pelenovich,
• Zhenguo Wang,
• Wenbin Zuo,
• Sergey Belykh,
• Alexander Tolstogouzov,
• Dejun Fu and
• Xiangheng Xiao

Beilstein J. Nanotechnol. 2019, 10, 135–143, doi:10.3762/bjnano.10.13

• surface morphology, with preferable erosion of hills as compared with valleys [6], which also results in the smoothing of the surface [7]. Sputtering by an argon cluster beam has been studied for many pure metals (Cu, Ag, Au, W, Pt, Ni) and their alloys, semiconductors (Si and SiC), and insulators (SiO2

Threshold voltage decrease in a thermotropic nematic liquid crystal doped with graphene oxide flakes

• Mateusz Mrukiewicz,
• Krystian Kowiorski,
• Paweł Perkowski,
• Rafał Mazur and
• Małgorzata Djas

Beilstein J. Nanotechnol. 2019, 10, 71–78, doi:10.3762/bjnano.10.7

• nanoparticles of MgO and SiO2 [6]. Here, the effect was caused by the reduction of the order parameter S. The concentration-dependent enhancement of the electro-optic response was observed for Ti and TiO2 nanoparticles dispersed in NLC [7][8]. The significant effect of ferroelectric Sn2P2S6 on the threshold

Bidirectional biomimetic flow sensing with antiparallel and curved artificial hair sensors

• Claudio Abels,
• Antonio Qualtieri,
• Toni Lober,
• Alessandro Mariotti,
• Lily D. Chambers,
• Massimo De Vittorio,
• William M. Megill and
• Francesco Rizzi

Beilstein J. Nanotechnol. 2019, 10, 32–46, doi:10.3762/bjnano.10.4

• stress-driven artificial hair sensor. The fabrication process is subdivided into the following main steps: Depositing functional material layers: The flow sensor is based on a silicon-on-insulator (SOI) substrate which is made up of a 400 μm silicon wafer, a 2 μm thick silicon dioxide (SiO2) insulation

• the cantilever beams (300 nm etching depth). Subsequently, anisotropic back side wet etching with a potassium hydroxide (KOH) 28% solution at 85 °C creates two cavities underneath the cantilever beams (400 μm etching depth). The SiO2 insulating layer acts as an etching barrier. Next, a hydrofluoric

• acid (HF) back side wet etching step removes the SiO2 layer (2 μm etching depth). By performing a last KOH top side wet etching, the exposed (U-shaped) silicon device layer around the cantilevers is removed (2 μm etching depth). Due to the residual stress in the material, the released SiN/Si bilayer

Zn/F-doped tin oxide nanoparticles synthesized by laser pyrolysis: structural and optical properties

• Florian Dumitrache,
• Iuliana P. Morjan,
• Elena Dutu,
• Ion Morjan,
• Claudiu Teodor Fleaca,
• Monica Scarisoreanu,
• Alina Ilie,
• Marius Dumitru,
• Cristian Mihailescu,
• Adriana Smarandache and
• Gabriel Prodan

Beilstein J. Nanotechnol. 2019, 10, 9–21, doi:10.3762/bjnano.10.2

• values. A clear optical behavior influence of the presence of carbon layers on tin dioxide can be observed for the SnO2@C and SnO2@SiO2@C nanostructured microspheres (C symbolizing here reduced graphene oxide, rGO) reported in [53], where the UV–vis spectra show a clear increase in absorbance (mostly in

• the visible domain, but also in the 320–400 nm UV zone) when compared with pure SnO2. Consequently, the resulting bandgap values diminished from 3.6 eV in pure SnO2 down to 3.2 eV for both SnO2@SiO2@C and SnO2@C samples [53]. A similar behavior can also be supposed for our carbon-containing tin oxide

Electrostatic force microscopy for the accurate characterization of interphases in nanocomposites

• Diana El Khoury,
• Richard Arinero,
• Jean-Charles Laurentie,
• Mikhaël Bechelany,
• Michel Ramonda and
• Jérôme Castellon

Beilstein J. Nanotechnol. 2018, 9, 2999–3012, doi:10.3762/bjnano.9.279

• nm) were deposited or grown over the whole sample surface. Aluminum oxide (Al2O3) shells were prepared using the atomic layer deposition (ALD) method, polyvinyl acetate (PVAc) shells by spin coating, and silicon dioxide (SiO2) shells by plasma sputtering deposition (PSD). The signature of each

• to produce samples that lack a surface matrix layer without influencing the initial properties of the interphase. Therefore, it would be more realistic to compare samples that model nanodielectrics with and without an interphase. Approach 2: PS + 50 nm SiO2 and PS + 100 nm Al2O3 + 50 nm SiO2 In the

• second approach, the comparison was between model nanodielectric samples without (PS + 50 nm SiO2) and with an interphase (PS + 100 nm Al2O3 + 50 nm SiO2) in which the matrix thickness was kept constant (Figure 3). To this aim, matrix deposition required a technique that allows the precise control of the

Colloidal chemistry with patchy silica nanoparticles

• Pierre-Etienne Rouet,
• Cyril Chomette,
• Laurent Adumeau,
• Etienne Duguet and
• Serge Ravaine

Beilstein J. Nanotechnol. 2018, 9, 2989–2998, doi:10.3762/bjnano.9.278

• calculated based on a minimum of 500 nanoparticles per batch using the following equation: where and are the number-average and the weight-average diameter, respectively, and ni is the number of particles of diameter Di. Synthesis of the Au@SiO2 nanoparticles Gold nanoparticles of 14 ± 2 nm were prepared

• by the citrate-reduction method reported by Turkevich [29]. SiO2 coating was carried out after surface functionalization of the gold nanoparticles by using a PEG-SH (Mw = 5000) aqueous solution in a similar manner as described in [23]. The surface modification allowed for the replacement of the

Co-intercalated layered double hydroxides as thermal and photo-oxidation stabilizers for polypropylene

• Qian Zhang,
• Qiyu Gu,
• Fabrice Leroux,
• Pinggui Tang,
• Dianqing Li and
• Yongjun Feng

Beilstein J. Nanotechnol. 2018, 9, 2980–2988, doi:10.3762/bjnano.9.277

• functional additives have attracted increasing attention for their wide applications in polymers [7]. Organic anti-aging species have been immobilized onto inorganic supports (e.g., carbon nanotubes, SiO2, graphene oxide) to produce inorganic–organic composites with higher migration resistance [8][9][10

Size limits of magnetic-domain engineering in continuous in-plane exchange-bias prototype films

• Alexander Gaul,
• Daniel Emmrich,
• Timo Ueltzhöffer,
• Henning Huckfeldt,
• Hatice Doğanay,
• Johanna Hackl,
• Muhammad Imtiaz Khan,
• Daniel M. Gottlob,
• Gregor Hartmann,
• André Beyer,
• Dennis Holzinger,
• Slavomír Nemšák,
• Claus M. Schneider,
• Armin Gölzhäuser,
• Günter Reiss and
• Arno Ehresmann

Beilstein J. Nanotechnol. 2018, 9, 2968–2979, doi:10.3762/bjnano.9.276

• were approximated from the density values of pure metals using with x being the mole fraction, x = n/100. The SRIM compound correction was deactivated for all layers except SiO2. Simulations were performed using the monolayer collision mode for 2 × 106 helium ions with a kinetic energy of 15 keV

Ternary nanocomposites of reduced graphene oxide, polyaniline and hexaniobate: hierarchical architecture and high polaron formation

• Claudio H. B. Silva,
• Maria Iliut,
• Christopher Muryn,
• Christian Berger,
• Zachary Coldrick,
• Vera R. L. Constantino,
• Marcia L. A. Temperini and
• Aravind Vijayaraghavan

Beilstein J. Nanotechnol. 2018, 9, 2936–2946, doi:10.3762/bjnano.9.272

• smooth monolayer rGO particles, which are partially restacked when deposited on the Si/SiO2 substrate. The AFM images of the rGO/PANI nanocomposite show similar flake dimensions (ca. 25 μm) as the rGO-25 sample, and no granular particles were observed, as reported for PANI aggregates [36]. On the other

• prepared by spincoating the dispersions of rGO, rGO/PANI and rGO/PANI/hexNb (1.0 mg·mL−1 total concentration) on Si/SiO2 substrates at 3000 rpm (300 rpm·s−1 acceleration, 90 s). In order to properly compare the AFM images, processing was performed with the aid of WSxM software (version 4.0 Beta 7.0) [69

Site-controlled formation of single Si nanocrystals in a buried SiO₂ matrix using ion beam mixing

• Xiaomo Xu,
• Thomas Prüfer,
• Daniel Wolf,
• Hans-Jürgen Engelmann,
• Lothar Bischoff,
• René Hübner,
• Karl-Heinz Heinig,
• Wolfhard Möller,
• Stefan Facsko,
• Johannes von Borany and
• Gregor Hlawacek

Beilstein J. Nanotechnol. 2018, 9, 2883–2892, doi:10.3762/bjnano.9.267

• + or Ne+ ion beam mixing of Si into a buried SiO2 layer followed by thermally activated phase separation. Binary collision approximation and kinetic Monte Carlo methods are conducted to gain atomistic insight into the influence of relevant experimental parameters on the Si NC formation process. Energy

• between the SiO2 layers and perpendicular to the incident Ne+ beam. Keywords: helium ion microscopy; ion beam mixing; Monte Carlo simulations; phase separation; single electron transistor; Introduction Silicon has been the main material in the semiconductor industry for almost all use cases with the

• particular, various groups have demonstrated the usage of a Si NC embedded in an SiO2 matrix as a Coulomb island for a single electron transistor (SET) device [7][8][9]. However, so far Si NC-based SET devices lack either the ability of room-temperature operation or the compatibility to complimentary metal

Charged particle single nanometre manufacturing

• Philip D. Prewett,
• Cornelis W. Hagen,
• Claudia Lenk,
• Steve Lenk,
• Marcus Kaestner,
• Tzvetan Ivanov,
• Ahmad Ahmad,
• Ivo W. Rangelow,
• Xiaoqing Shi,
• Stuart A. Boden,
• Alex P. G. Robinson,
• Dongxu Yang,
• Sangeetha Hari,
• Marijke Scotuzzi and
• Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

• combined with CVD. As another example, 5 nm GaN quantum dots were deposited by Crozier [86] by EBID from a specially tailored precursor resulting in high-quality uniform deposits on a thin film of Si/SiO2. Shimojo [87] demonstrated the deposition of self-standing nanorods, 10 nm in diameter, by electrons

• [88] when SiO2 and Si3N4 substrates were etched by electrons in the presence of XeF2 gas, whereas no etching was observed in the presence of either electrons or gas molecules alone. Since then, several reports and applications of gas-assisted etching using focused electron beams have appeared in the

• due to the increased SE yield from the nanowire sidewalls. The enhanced contrast of the nanowire edges seen in the SE image lends support to their theory. The advantage of working in an ESEM was the possibility of charge counteraction, allowing the use of insulating substrates like SiO2 that are

Nanoantenna structures for the detection of phonons in nanocrystals

• Alexander G. Milekhin,
• Sergei A. Kuznetsov,
• Ilya A. Milekhin,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Alexander V. Latyshev,
• Volodymyr M. Dzhagan and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2018, 9, 2646–2656, doi:10.3762/bjnano.9.246

• as high as 1 × 106. In our earlier papers we demonstrated SEIRA in the mid- and far-infrared for both organic molecules and inorganic NCs deposited on Au linear nanoantenna arrays fabricated on Si substrates by nanolithography [22][23]. The influence of a thin SiO2 layer (0–100 nm) beneath the

• nanoantenna arrays on the LSPR energy, as well as the LSP penetration depth into SiO2 were established [12]. We also showed that diffraction modes in linear Au nanoantenna arrays propagating along the Si surface and perpendicular to the nanoantennas [24] can be effectively employed for further enhancement of

• , differing in nanoantenna length and lateral periodicity, were fabricated on bare Si(001) substrates and substrates covered with SiO2 layers of different (5–100 nm) thicknesses by direct electron beam writing (Raith-150, Germany) as described earlier [23][31]. For H-shaped nanoantennas, additional Au