Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

• Adrian Iovan,
• Marco Fischer,
• Roberto Lo Conte and
• Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

• forms a hard mask for subsequent ion milling. After a 5 min Ar-plasma etch to remove surface residue, 7 min long ion milling etches through the 10 nm thick Au layer and slightly into the SiO2 substrate, thus transferring the hexagonal pattern of sub-10 nm polystyrene particles into sub-10 nm pattern of

• photomask. The top electrode mask has different diameter disks and half-disks in the range of 10–50 µm. The pattern transfer is done by ion milling for 1 h. The etching time was calibrated by using surface profilometry such as to stop the etching at the Al bottom electrode. The sample was then capped with a

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• linked with the optical function of the structures. Current techniques for the fabrication of plasmonic cavities include electrochemical growth combined with nanosphere lithography [25][35], electron-beam lithography [36], etching techniques [37][38][39][40] and focused ion beam milling [41][42][43]. The

• techniques based on electron beam lithography and focused ion beam milling allow us to obtain structures of arbitrary shape and two-dimensional profile, but they are size limited and time consuming. Applications outside of sensing are also envisaged. Plasmonic resonators can not only confine light but can

Manipulation of gold colloidal nanoparticles with atomic force microscopy in dynamic mode: influence of particle–substrate chemistry and morphology, and of operating conditions

• Samer Darwich,
• Karine Mougin,
• Akshata Rao,
• Enrico Gnecco,
• Shrisudersan Jayaraman and
• Hamidou Haidara

Beilstein J. Nanotechnol. 2011, 2, 85–98, doi:10.3762/bjnano.2.10

• (FIB) milling technique. The width and depth of the pits are 650 nm and 5 nm, respectively, and the spacing between two adjacent pits is 125 nm. On the patterned surface, the mean direction of motion remains identical (on average), even after a long acquisition time. This stability of the direction of

Biomimetics inspired surfaces for drag reduction and oleophobicity/philicity

• Bharat Bhushan

Beilstein J. Nanotechnol. 2011, 2, 66–84, doi:10.3762/bjnano.2.9

• using a FlashCut CNC milling machine [21]. Bechert et al. [57] and Dean and Bhushan [22] have reported that optimal groove depth for the rib surface should be about half of the lateral rib spacing for low drag. In the rib pattern design selected here, multiple stacks of ribs oriented along an axis were

• fabricated. For the fabrication, first a model of a rib-patterned surface was designed in SolidWorks, and then the code for the rib’s height, width, spacing and lengths, and channel dimensions was written with FeatureCAM in order to fabricate structures using the CNC milling machine. An acrylic resin was

Magnetic coupling mechanisms in particle/thin film composite systems

• Giovanni A. Badini Confalonieri,
• Philipp Szary,
• Durgamadhab Mishra,
• Maria J. Benitez,
• Mathias Feyen,
• An Hui Lu,
• Leonardo Agudo,
• Gunther Eggeler,
• Oleg Petracic and
• Hartmut Zabel

Beilstein J. Nanotechnol. 2010, 1, 101–107, doi:10.3762/bjnano.1.12

• without ion-milling. The nanoparticle array showed a collective super-spin behavior due to dipolar interparticle coupling. In the composite system, we observed a decoupling into two nanoparticle subsystems. In the ion-milled system, the nanoparticle layer served as a magnetic flux guide as observed by

• composites are prepared by physical growth methods, such as sputtering [18][19], sequential pulsed laser deposition [20][21], sputtering gas aggregation [22] or mechanical milling [23]. In this work, we report a different approach to fabricate composite nanoparticle/thin-film materials, i.e., which combines

• a structural coherence length, as probed by scattering techniques, in the order of 200–300 nm [28]. AFM observations, shown in Figure 1a, also confirm the hexagonal close-packed ordering with an average surface roughness of the film of approximately 1.4 nm. Ion-milling carried out at the surface of

Preparation and characterization of supported magnetic nanoparticles prepared by reverse micelles

• Ulf Wiedwald,
• Luyang Han,
• Johannes Biskupek,
• Ute Kaiser and
• Paul Ziemann

Beilstein J. Nanotechnol. 2010, 1, 24–47, doi:10.3762/bjnano.1.5

• . Possibly the simplest approach is ball milling of the corresponding bulk materials. This mostly yields a rather broad size distribution, which, in turn, often hinders the study of size-dependent properties [15]. A better defined physical approach is inert-gas condensation where NPs are formed by sputtering