Optical response of heterogeneous polymer layers containing silver nanostructures

• Miriam Carlberg,
• Florent Pourcin,
• Olivier Margeat,
• Judikaël Le Rouzo,
• Gérard Berginc,
• Rose-Marie Sauvage,
• Jörg Ackermann and
• Ludovic Escoubas

Beilstein J. Nanotechnol. 2017, 8, 1065–1072, doi:10.3762/bjnano.8.108

• physical vapor deposition methods require high energy sources, such as lasers [16], whereas chemical synthesis produces, among other shapes, nanospheres and nanoprisms of different sizes in water at room temperature. Taking advantage of the size and shape versatility of this chemical synthesis, we aim to

The integration of graphene into microelectronic devices

• Guenther Ruhl,
• Sebastian Wittmann,
• Matthias Koenig and
• Daniel Neumaier

Beilstein J. Nanotechnol. 2017, 8, 1056–1064, doi:10.3762/bjnano.8.107

• , epitaxy on silicon carbide or chemical vapor deposition (CVD) on catalytic metals [5]. Besides meeting the requirements of film quality and cost, the scalability to 200 or 300 mm wafer sizes is crucial for being suitable for industrial production. Currently, the highest-quality graphene synthesis method

• methods have been proposed [7], which can be grouped into the following categories. 1.1 Ex situ transfer The CVD growth substrate can either be a copper foil, which is most commonly used, or a Cu film deposited by physical vapor deposition (PVD) on a silicon wafer substrate with a diffusion barrier

Needs and challenges for assessing the environmental impacts of engineered nanomaterials (ENMs)

• Michelle Romero-Franco,
• Hilary A. Godwin,
• Muhammad Bilal and
• Yoram Cohen

Beilstein J. Nanotechnol. 2017, 8, 989–1014, doi:10.3762/bjnano.8.101

• assessment of carbon nanotubes (CNTs) reported by Eckelman et al. [38]. This latter study compared the environmental impacts (in freshwater) of chemical releases resulting from the manufacture (e.g., arc ablation, chemical vapor deposition (CVD), and high-pressure carbon monoxide (HiPco)) for a hypothetical

Nanoantenna-assisted plasmonic enhancement of IR absorption of vibrational modes of organic molecules

• Alexander G. Milekhin,
• Olga Cherkasova,
• Sergei A. Kuznetsov,
• Ilya A. Milekhin,
• Ekatherina E. Rodyakina,
• Alexander V. Latyshev,
• Sreetama Banerjee,
• Georgeta Salvan and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2017, 8, 975–981, doi:10.3762/bjnano.8.99

• arrays were controlled by a scanning electron microscopy (SEM) using the same Raith-150 system at 10 kV acceleration voltage, 30 µm aperture, and 6 mm working distance. Ultrathin CoPc films with thickness 3 and 10 nm were formed using organic molecular beam vapor deposition onto arrays of Au nanoantennas

Vapor-phase-synthesized fluoroacrylate polymer thin films: thermal stability and structural properties

• Paul Christian and
• Anna Maria Coclite

Beilstein J. Nanotechnol. 2017, 8, 933–942, doi:10.3762/bjnano.8.95

• chemical vapor deposition (iCVD) were investigated. PFDA polymers are known for their interesting crystalline aggregation into a lamellar structure that induces super-hydrophobicity and oleophobicity. Nevertheless, when considering applications which involve chemical, mechanical and thermal stresses, it is

• surfaces based on perfluoroacrylates were previously prepared by initiated chemical vapor deposition (iCVD) [8]. The iCVD technique allows polymerization of the fluorinated monomers, while the chemical structure of the precursor(s) remains intact. Therefore, ultrathin (<100 nm) perfluoropolymers can be

• used without further purification. p-PFDA films with different degrees of cross-linking were prepared by initiated chemical vapor deposition (iCVD). The average thickness of the as-deposited polymer films was 350 ± 50 nm. Detailed information on the actual processing conditions are provided in

High photocatalytic activity of Fe₂O₃/TiO₂ nanocomposites prepared by photodeposition for degradation of 2,4-dichlorophenoxyacetic acid

• Shu Chin Lee,
• Hendrik O. Lintang and
• Leny Yuliati

Beilstein J. Nanotechnol. 2017, 8, 915–926, doi:10.3762/bjnano.8.93

• ], plasma enhanced-chemical vapor deposition (PE-CVD) and radio frequency (RF) sputtering approach [12], and plasma enhanced-chemical vapor deposition and atomic layer deposition (ALD) followed by thermal treatment [13]. Among these preparation methods, impregnation is a commonly used approach for the

Synthesis of coaxial nanotubes of polyaniline and poly(hydroxyethyl methacrylate) by oxidative/initiated chemical vapor deposition

• Alper Balkan,
• Efe Armagan and
• Gozde Ozaydin Ince

Beilstein J. Nanotechnol. 2017, 8, 872–882, doi:10.3762/bjnano.8.89

• .8.89 Abstract Vapor-phase synthesis techniques of polymeric nanostructures offer unique advantages over conventional, solution-based techniques because of their solventless nature. In this work, we report the fabrication of coaxial polymer nanotubes using two different chemical vapor deposition methods

• . The fabrication process involves the deposition of an outer layer of the conductive polyaniline (PANI) by oxidative chemical vapor deposition, followed by the deposition of the inner layer of poly(2-hydroxyethyl methacrylate) (pHEMA) hydrogel by initiated chemical vapor deposition. The vapor-phase

• continuously increase with relative humidity. Keywords: coaxial nanotubes; humidity sensors; initiated chemical vapor deposition; oxidative chemical vapor deposition; polyaniline; Introduction In recent years, with the advances in nanotechnology, the use of nanostructured materials has become widespread in

Relationships between chemical structure, mechanical properties and materials processing in nanopatterned organosilicate fins

• Gheorghe Stan,
• Richard S. Gates,
• Qichi Hu,
• Kevin Kjoller,
• Craig Prater,
• Kanwal Jit Singh,
• Ebony Mays and
• Sean W. King

Beilstein J. Nanotechnol. 2017, 8, 863–871, doi:10.3762/bjnano.8.88

• science [9][10][11][12]. Experimental Fabrication of nanoporous fins The nanoporous organosilicate fin structures examined in this study were fabricated using a previously described subtractive pitch quartering process [34][35]. Briefly, plasma-enhanced chemical vapor deposition (PECVD) was used to

• state-of-the-art metal interconnect structure. This process flow specifically consisted of plasma cleaning, physical vapor deposition (PVD), chemical mechanical planarization (CMP) and wet chemical cleaning steps that have all shown the potential to remove terminal organic groups from the matrix of

Investigation of growth dynamics of carbon nanotubes

• Marianna V. Kharlamova

Beilstein J. Nanotechnol. 2017, 8, 826–856, doi:10.3762/bjnano.8.85

• developing the methods of their efficient synthesis. During last years, significant progress was made in this field. The arc-discharge, laser ablation and chemical vapor deposition (CVD) methods were optimized for the synthesis of SWCNTs in a high yield [5][6]. Synthesis parameters can be varied in a broad

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• sufficient to initiate carbon removal without inducing significant thermal drift and/or laser chemical vapor deposition (CVD). Laser pulses are delivered to the sample with an optical working distance of 9 mm using a multi-mode 100 µm diameter fiber optic cable housed within a stainless steel shaft with

• situation at elevated temperatures. MeCpPt(IV)Me3 was originally developed for use as a thermal chemical vapor deposition (CVD) precursor [75]; the thermal decomposition temperature on the order of 120 °C in the presence of H2 results in pure Pt films. Thus, with LAEBID we leverage the pulsed thermal energy

Vapor deposition routes to conformal polymer thin films

• Priya Moni,
• Ahmed Al-Obeidi and
• Karen K. Gleason

Beilstein J. Nanotechnol. 2017, 8, 723–735, doi:10.3762/bjnano.8.76

• , USA 10.3762/bjnano.8.76 Abstract Vapor phase syntheses, including parylene chemical vapor deposition (CVD) and initiated CVD, enable the deposition of conformal polymer thin films to benefit a diverse array of applications. This short review for nanotechnologists, including those new to vapor

• deposition methods, covers the basic theory in designing a conformal polymer film vapor deposition, sample preparation and imaging techniques to assess film conformality, and several applications that have benefited from vapor deposited, conformal polymer thin films. Keywords: conformal; polymers; thin

• films; vapor deposition; Review Introduction Conformal coverage is achieved when a film of uniform thickness precisely follows the geometry of the underlying substrate. Conformal coatings allow for surface properties to be optimized independently from the choice of the bulk material and shape of the

Ion beam profiling from the interaction with a freestanding 2D layer

• Ivan Shorubalko,
• Kyoungjun Choi,
• Michael Stiefel and
• Hyung Gyu Park

Beilstein J. Nanotechnol. 2017, 8, 682–687, doi:10.3762/bjnano.8.73

• vapor deposition (CVD) according to a previously developed method [19]. This method is optimized for maximal grain connectivity resulting in uniform graphene films. Then, graphene was transferred to silicon/silicon-nitride frames with openings of a few micrometers in diameter. A PMMA-based graphene

Gas sensing properties of MWCNT layers electrochemically decorated with Au and Pd nanoparticles

• Elena Dilonardo,
• Michele Penza,
• Marco Alvisi,
• Riccardo Rossi,
• Gennaro Cassano,
• Cinzia Di Franco,
• Francesco Palmisano,
• Luisa Torsi and
• Nicola Cioffi

Beilstein J. Nanotechnol. 2017, 8, 592–603, doi:10.3762/bjnano.8.64

• MWCNTs, for gas sensing applications. Experimental Preparation of metal-decorated MWCNT-based chemiresistors MWCNT networked films were grown by chemical vapor deposition (CVD) directly onto the surface of an alumina substrate that was previously coated with a cobalt (Co) sputtered catalytic layer (≈6 nm

Thin SnO_x films for surface plasmon resonance enhanced ellipsometric gas sensing (SPREE)

• Daniel Fischer,
• Andreas Hertwig,
• Uwe Beck,
• Volkmar Lohse,
• Detlef Negendank,
• Martin Kormunda and
• Norbert Esser

Beilstein J. Nanotechnol. 2017, 8, 522–529, doi:10.3762/bjnano.8.56

• , several different coating methods were developed which include chemical vapor deposition [11], sol–gel [12], spray pyrolysis [13], sputtering [14][15][16] and electron beam evaporation [17]. In our approach, we aim to develop a new sensing concept which combines the adsorption concept of MOS sensors with

Advances in the fabrication of graphene transistors on flexible substrates

• Gabriele Fisichella,
• Stella Lo Verso,
• Silvestra Di Marco,
• Vincenzo Vinciguerra,
• Emanuela Schilirò,
• Salvatore Di Franco,
• Raffaella Lo Nigro,
• Fabrizio Roccaforte,
• Amaia Zurutuza,
• Alba Centeno,
• Sebastiano Ravesi and
• Filippo Giannazzo

Beilstein J. Nanotechnol. 2017, 8, 467–474, doi:10.3762/bjnano.8.50

• transferred to the target substrate. In this sense, the use of graphene grown by chemical vapor deposition (CVD) on various metals (Ni [7], Cu [13]) and using various precursors [14] represents the most suitable choice. Among the various device architectures, Gr-FET-based sensors can represent a great

The longstanding challenge of the nanocrystallization of 1,3,5-trinitroperhydro-1,3,5-triazine (RDX)

• Florent Pessina and
• Denis Spitzer

Beilstein J. Nanotechnol. 2017, 8, 452–466, doi:10.3762/bjnano.8.49

• quantification by Rietveld or full pattern matching methods would have been useful to follow the conversion with time. Dry production methods Physical vapor deposition (PVD) In 2002, Frolov and Pivkina first reported on a vacuum condensation process for high energetic materials [38][39][40]. The vacuum

• quartz substrate and pressing into tablets). Mil’chenko et al. [41] delved further in the physical vapor deposition (PVD) process with the deposition of 2,4,6-triamino-1,3,5-trinitrobenzene (TATB), HMX, RDX, PETN and BTF as thin layers on several substrates such as plexiglas and copper while changing

• rate of a continuous hydrothermal process from 1–10 tons/year to 100 tons/year for inorganic nanomaterials [123]. Tsuzuki et al. [124] statistically studied which methods for inorganic nanosynthesis are mostly employed in industry: vapor (39% mainly chemical vapor deposition (CVD)) and liquid (45

Study of the surface properties of ZnO nanocolumns used for thin-film solar cells

• Neda Neykova,
• Jiri Stuchlik,
• Karel Hruska,
• Ales Poruba,
• Zdenek Remes and
• Ognen Pop-Georgievski

Beilstein J. Nanotechnol. 2017, 8, 446–451, doi:10.3762/bjnano.8.48

• advantageously used for all other thin-film solar cells. So far, a wide diversity of methods have been used for the preparation of ZnO nanocolumns such as metal organic chemical vapor deposition (MOCVD) [11], electrochemical deposition [12], sputtering [13], reactive ion etching [5] and the hydrothermal method

Fabrication of black-gold coatings by glancing angle deposition with sputtering

• Alan Vitrey,
• Rafael Alvarez,
• Alberto Palmero,
• María Ujué González and
• José Miguel García-Martín

Beilstein J. Nanotechnol. 2017, 8, 434–439, doi:10.3762/bjnano.8.46

• method to produce black-metal coatings in the visible range is of the utmost importance for some of the abovementioned applications that require conducting behavior. Physical vapor deposition (PVD) techniques are used to manufacture high-purity thin-film coatings in an environmentally friendly manner (no

Role of oxygen in wetting of copper nanoparticles on silicon surfaces at elevated temperature

• Tapas Ghosh and
• Biswarup Satpati

Beilstein J. Nanotechnol. 2017, 8, 425–433, doi:10.3762/bjnano.8.45

• of CuO nanostructures on Si surfaces. There are several techniques such as physical vapor deposition (PVD), chemical vapor deposition (CVD), electroplating, etc., that can be used to create Cu films. For the PVD and CVD techniques, high vacuum is required, which takes enormous effort and also

In-situ monitoring by Raman spectroscopy of the thermal doping of graphene and MoS₂ in O₂-controlled atmosphere

• Aurora Piazza,
• Filippo Giannazzo,
• Gianpiero Buscarino,
• Gabriele Fisichella,
• Antonino La Magna,
• Fabrizio Roccaforte,
• Marco Cannas,
• Franco Mario Gelardi and
• Simonpietro Agnello

Beilstein J. Nanotechnol. 2017, 8, 418–424, doi:10.3762/bjnano.8.44

• ] and chemical vapor deposition (CVD) on catalytic metals [9][10] followed by the poly(methyl methacrylate) (PMMA) assisted transfer [11][12], enlarged the interest and perspectives for applications. In particular in view of the realization of electronic devices and to obtain Gr-based field effect

• monolayer Gr and mechanically exfoliated MoS2 deposited on SiO2. The Gr samples were produced by chemical vapor deposition process on a Cu foil [11][19]. After Gr growth the foils were covered by PMMA and Cu was removed in a FeCl3 bath. Successively, a transfer process on a 300 nm thick SiO2 layer on Si

Impact of contact resistance on the electrical properties of MoS₂ transistors at practical operating temperatures

• Filippo Giannazzo,
• Gabriele Fisichella,
• Aurora Piazza,
• Salvatore Di Franco,
• Giuseppe Greco,
• Simonpietro Agnello and
• Fabrizio Roccaforte

Beilstein J. Nanotechnol. 2017, 8, 254–263, doi:10.3762/bjnano.8.28

• demonstrated using single [3] and multilayers of MoS2 [4]. MoS2 thin films, obtained either by cleavage from the bulk material or by chemical vapor deposition, are typically unintentionally n-type doped. Since well-assessed methods for doping enrichment of MoS2 under source/drain contacts are still lacking

Phosphorus-doped silicon nanorod anodes for high power lithium-ion batteries

• Chao Yan,
• Qianru Liu,
• Jianzhi Gao,
• Zhibo Yang and
• Deyan He

Beilstein J. Nanotechnol. 2017, 8, 222–228, doi:10.3762/bjnano.8.24

• applied at room temperature. After 12 min, the Cu foil was taken out and washed with deionized water thoroughly. The Si anode was fabricated through deposition of a heavy-phosphorus-doped Si layer directly onto the CuO nanorods via a radio frequency, capacitively coupled, plasma-enhanced chemical vapor

• deposition (PECVD) device. Typically, the source gas for PECVD was silane (10%, diluted with hydrogen) with a flow rate of 50 sccm mixed with phosphine (5%, diluted with hydrogen) with a flow rate of 5 sccm. The deposition pressure and substrate temperature were 80 Pa and 150 °C, respectively. The structural

Nitrogen-doped twisted graphene grown on copper by atmospheric pressure CVD from a decane precursor

• Ivan V. Komissarov,
• Nikolai G. Kovalchuk,
• Vladimir A. Labunov,
• Ksenia V. Girel,
• Olga V. Korolik,
• Mikhail S. Tivanov,
• Algirdas Lazauskas,
• Mindaugas Andrulevičius,
• Tomas Tamulevičius,
• Viktoras Grigaliūnas,
• Šarunas Meškinis,
• Sigitas Tamulevičius and
• Serghej L. Prischepa

Beilstein J. Nanotechnol. 2017, 8, 145–158, doi:10.3762/bjnano.8.15

• from both fundamental and applied aspects. TG can be obtained by different methods, e.g., by means of graphene folding, graphene layer stacking, thermal decomposition of SiC [9] or chemical vapor deposition (CVD) on metal catalysts [10][11]. Generally speaking, CVD is one of the most common methods to

Impact of surface wettability on S-layer recrystallization: a real-time characterization by QCM-D

• Jagoba Iturri,
• Ana C. Vianna,
• Alberto Moreno-Cencerrado,
• Dietmar Pum,
• Uwe B. Sleytr and
• José Luis Toca-Herrera

Beilstein J. Nanotechnol. 2017, 8, 91–98, doi:10.3762/bjnano.8.10

• isolated SbpA bacterial surface proteins onto silicon dioxide substrates of different surface wettability. Surface modification by UV/ozone oxidation or by vapor deposition of 1H,1H,2H,2H-perfluorododecyltrichlorosilane yielded hydrophilic or hydrophobic samples, respectively. Time evolution of frequency

• either oxidative treatments (UV/ozone) or vapor deposition of a fluorinated silane the wetting properties of the substrate could be easily tailored to be hydrophilic or hydrophobic. Then, exposure of the samples to SbpA and their subsequent evolution in time was followed in situ by QCM-D with the support

• protocol was applied to hydrophilic SiO2 sensors with the exception of the overnight vapor deposition. All experiments were performed at 25 °C. Real-time variations of Frequency (Δf) and dissipation (ΔD) parameters were observed at several overtones (n = 3, 5, 7,...,13) throughout the QCM-D experiment

Sub-nanosecond light-pulse generation with waveguide-coupled carbon nanotube transducers

• Felix Pyatkov,
• Svetlana Khasminskaya,
• Vadim Kovalyuk,
• Frank Hennrich,
• Manfred M. Kappes,
• Gregory N. Goltsman,
• Wolfram H. P. Pernice and
• Ralph Krupke

Beilstein J. Nanotechnol. 2017, 8, 38–44, doi:10.3762/bjnano.8.5

• electron beam lithography on top of Si3N4/SiO2/Si substrate. Au/Cr contacts were produced by physical vapor deposition, and 600 nm wide, half-etched Si3N4-waveguides were formed with reactive ion etching. A typical sample contains tens of contact pairs and CNTs that were placed in between using