Tip-enhanced Raman spectroscopic imaging of patterned thiol monolayers

• Johannes Stadler,
• Thomas Schmid,
• Lothar Opilik,
• Phillip Kuhn,
• Petra S. Dittrich and
• Renato Zenobi

Beilstein J. Nanotechnol. 2011, 2, 509–515, doi:10.3762/bjnano.2.55

• likely that a very small fraction of molecules diffusing on the Ag surface during production of the samples dominated the spectra, preventing a localization of the molecules. Another possible explanation is that the roughness of the SERS substrate interfered with the patterning process used (compare

Towards multiple readout application of plasmonic arrays

• Dana Cialla,
• Karina Weber,
• René Böhme,
• Uwe Hübner,
• Henrik Schneidewind,
• Matthias Zeisberger,
• Roland Mattheis,
• Robert Möller and
• Jürgen Popp

Beilstein J. Nanotechnol. 2011, 2, 501–508, doi:10.3762/bjnano.2.54

• enhancement across a large area [22]. By virtue of the patterning process, the optical parameters are tunable by varying both the size of the nanoparticles and the period of the array [23], which leads to design and fabrication strategies of SERS arrays developed to gain a maximum SERS enhancement [24

Plasmonic nanostructures fabricated using nanosphere-lithography, soft-lithography and plasma etching

• Manuel R. Gonçalves,
• Taron Makaryan,
• Fabian Enderle,
• Stefan Wiedemann,
• Alfred Plettl,
• Othmar Marti and
• Paul Ziemann

Beilstein J. Nanotechnol. 2011, 2, 448–458, doi:10.3762/bjnano.2.49

• this kind require large area nanostructured surfaces. Thus only methods allowing large scale lithography/patterning are appropriate for this purpose. E-beam lithography and FIB based nanofabrication would be prohibitively expensive. The most common fabrication technique using arrays of polystyrene (PS

• nm. Nanoimprint lithography [55][56] is another alternative technique in which a pattern is formed on top of a substrate by pressing a mold against a thin resist film, followed by reactive ion etching (RIE) of the patterned substrate. This allows patterning of reproducible structures up to a few tens

Formation of precise 2D Au particle arrays via thermally induced dewetting on pre-patterned substrates

• Dong Wang,
• Ran Ji and
• Peter Schaaf

Beilstein J. Nanotechnol. 2011, 2, 318–326, doi:10.3762/bjnano.2.37

• Garching, Germany 10.3762/bjnano.2.37 Abstract The fabrication of precise 2D Au nanoparticle arrays over a large area is presented. The technique was based on pre-patterning of the substrate before the deposition of a thin Au film, and the creation of periodic particle arrays by subsequent dewetting

• was observed on a thin metal film that had been patterned using focused ion beam (FIB) before the dewetting process [34]. However, the FIB patterning is a time-consuming process. Giermann and Thompson reported the formation of a 2D ordered Au nanoparticle array, with uniform size and aligned

• technique, which was developed by Philips Research and SUSS MicroTec, combines the advantages of both UV nanoimprint lithography techniques with rigid stamp for the best resolution and with soft stamp for the large-area (6 inch area) patterning. Thermal oxide several nanometers thick was grown on the pre

Sorting of droplets by migration on structured surfaces

• Wilfried Konrad and
• Anita Roth-Nebelsick

Beilstein J. Nanotechnol. 2011, 2, 215–221, doi:10.3762/bjnano.2.25

• centre whereas lyophobic droplets would migrate away from it. A reverse migration order should result if the roles of A and B are interchanged or if point C is chosen as the centre and point D as the periphery. Discussion The specific surface patterning is not only able to initiate a spontaneous and

Manipulation of gold colloidal nanoparticles with atomic force microscopy in dynamic mode: influence of particle–substrate chemistry and morphology, and of operating conditions

• Samer Darwich,
• Karine Mougin,
• Akshata Rao,
• Enrico Gnecco,
• Shrisudersan Jayaraman and
• Hamidou Haidara

Beilstein J. Nanotechnol. 2011, 2, 85–98, doi:10.3762/bjnano.2.10

• . the shape, size and grafting of the NPs, as well as the surface chemistry and the patterning of the substrate, and finally the operating conditions (temperature, humidity and scan velocity). Whereas the operating conditions and substrate structure are shown to have a strong effect on the mobility of

A collisional model for AFM manipulation of rigid nanoparticles

• Enrico Gnecco

Beilstein J. Nanotechnol. 2010, 1, 158–162, doi:10.3762/bjnano.1.19

• direction of motion of arbitrarily shaped nanoparticles is important for the guided formation of nanostructures. An interesting analogy is found with AFM nanolithography. In a recent paper we have shown that the patterning of amorphous polymers can be ‘tuned’ by varying the scan path of an AFM tip which

Aerosol assisted fabrication of two dimensional ZnO island arrays and honeycomb patterns with identical lattice structures

• Mitsuhiro Numata and
• Yoshihiro Koide

Beilstein J. Nanotechnol. 2010, 1, 71–74, doi:10.3762/bjnano.1.9

• -dimensional photonic crystals (PhCs) [7][8][9]. To this end, a number of techniques, including an atomic layer epitaxy [10], chemical vapor deposition [11], and photoresist patterning [12][13], have been used to deposit various morphologies of ZnO patterns on substrates. There is intense current interest in

Flash laser annealing for controlling size and shape of magnetic alloy nanoparticles

• Damien Alloyeau,
• Christian Ricolleau,
• Cyril Langlois,
• Yann Le Bouar and
• Annick Loiseau

Beilstein J. Nanotechnol. 2010, 1, 55–59, doi:10.3762/bjnano.1.7

• produce organized CoPt or any bimetallic NPs on a substrate, by using an accurate patterning of the light field intensity designed by masks or gratings lithography [14][31]. Schematic representation of the experimental setup: the sample is placed behind the back focal plane of a convergent lens. The