Electron beam-based direct writing of nanostructures using a palladium β-ketoesterate complex

• Chinmai Sai Jureddy,
• Krzysztof Maćkosz,
• Aleksandra Butrymowicz-Kubiak,
• Iwona B. Szymańska,
• Patrik Hoffmann and
• Ivo Utke

Beilstein J. Nanotechnol. 2025, 16, 530–539, doi:10.3762/bjnano.16.41

• substrates were held at room temperature for [Pd(η5-Cp)(η3-allyl)] and [Pd(hfac)2], which may explain the lower carbon removal efficiency due to residual gas contamination or less effective thermal desorption processes. Comparison with [Cu(tbaoac)2] When comparing [Cu(tbaoac)2] and [Pd(tbaoac)2], the highest

• reported deposit metal content Cu/C/O was 1:2.3:0.5 [31], while for [Pd(tbaoac)2] in this work, the ratio Pd/C/O was 1:2:0.4, which are almost identical. However, considering the experimental conditions listed in Table 2, the substrate temperature was 30 °C higher for [Cu(tbaoac)2]. This increase in

• for [Cu(tbaoac)2] and [Pd(tbaoac)2] because they are also in the doublet and singlet states, respectively. Therefore, we anticipate a lower metal content for [Cu(tbaoac)2] than for [Pd(tbaoac)2] deposits. Furthermore, [Cu(tbaoac)2] produces comparatively larger fragments, see the mass spectrum from

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• may be removed more easily than previously anticipated, as exemplified by the electron-induced dissociation of benzene–Cr(CO)3 [17] and by FEBID using the fluorine-free precursor Cu(tbaoac)2 [18]. The most elegant approach to precursor design yet is to use a bimetallic molecular structure to predefine

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• fluorine free copper precursor, Cu(tbaoac)2 with the chemical sum formula CuC16O6H26 is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microscopy proved that

• measured from deposited pads was used to simulate the optical response of tip arrays fabricated out of the same precursor and showed good agreement with measurements. This paves the way for future plasmonic applications with copper-FEBID. Keywords: copper; Cu(tbaoac)2; focused electron beam induced