Ar⁺ implantation-induced tailoring of RF-sputtered ZnO films: structural, morphological, and optical properties

• Manu Bura,
• Divya Gupta,
• Arun Kumar and
• Sanjeev Aggarwal

Beilstein J. Nanotechnol. 2025, 16, 872–886, doi:10.3762/bjnano.16.66

• , Urbach energy, and optical bandgap. The low reflectance values of implanted films assure their suitability as transparent windows and anti-reflective coating in various optoelectronic devices. Keywords: AFM; diffuse reflectance; GXRD; polycrystalline; ZnO films; Introduction Zinc oxide has emerged as a

• –NIR spectrophotometer (UV-3600Plus) employed with Integrating Sphere Assembly (ISR-603) in the wavelength range of 200–800 nm. Results and Discussion Structural analysis Grazing incidence X-ray diffraction The grazing incidence X-ray diffraction (GXRD) patterns of pristine ZnO and argon-implanted ZnO

• of intrinsic defects in the films [21][22]. The presence of the same diffraction peaks in the GXRD pattern of implanted samples (Figure 2b–e) suggests the occurrence of identical crystal structures after implantation. To study the effect of implanted ions on the structure of the films, the more

N₂⁺-implantation-induced tailoring of structural, morphological, optical, and electrical characteristics of sputtered molybdenum thin films

• Usha Rani,
• Kafi Devi,
• Divya Gupta and
• Sanjeev Aggarwal

Beilstein J. Nanotechnol. 2025, 16, 495–509, doi:10.3762/bjnano.16.38

• thicknesses were implanted with 1 × 1017 N2+·cm−2 at 30 keV using a current density of 4 µA·cm−2. The structural properties of the deposited Mo thin films were investigated using a GXRD Bruker AXS GmbH D8 Advance X-ray diffractometer in grazing incidence geometry, employing Cu Kα radiation with a wavelength

• underscores the ions’ capacity to induce damage within the target material. Structural characteristics Figure 2 depicts the GXRD patterns of as-deposited and implanted Mo thin films (at an ion fluence of 1 × 1017 N2+·cm−2) with different thicknesses of 150, 200, 250, and 300 nm. The patterns indicate the face

• . Additionally, Table 1 shows that microstrain and dislocation density increased after implantation. The interplanar spacing of Mo thin films increased with film thickness [13][34]. Figure 3 shows the GXRD pattern for (111) diffraction peaks of as-deposited and implanted Mo thin films. The (111) peak position

Tailoring of physical properties of RF-sputtered ZnTe films: role of substrate temperature

• Kafi Devi,
• Usha Rani,
• Arun Kumar,
• Divya Gupta and
• Sanjeev Aggarwal

Beilstein J. Nanotechnol. 2025, 16, 333–348, doi:10.3762/bjnano.16.25

• ± 0.30 nm for the films deposited at room temperature, 300 °C, 400 °C, 500 °C, and 600 °C, respectively. The structural aspects of the ZnTe/Qz films were analysed using grazing incidence X-ray diffraction (GXRD) on a Bruker AXS D8 Advance with Cu Kα radiation (λ = 1.5406 Å) available at Ion Beam Centre

• X-ray diffraction studies GXRD patterns of ZnTe films grown on quartz substrates at different substrate temperatures (R.T.–600 °C) are presented in Figure 1. A broad hump in the GXRD pattern of the film deposited at room temperature indicates that the film is amorphous. The three diffraction peaks

• in the GXRD pattern at 2θ = 25.33°, 42.04°, and 49.47° correspond to (111), (220), and (311) reflection planes, respectively. They are observed for all films deposited above room temperature. Another diffraction peak at 2θ = 67.17°, corresponding to (331) reflection planes, starts evolving at a