N₂⁺-implantation-induced tailoring of structural, morphological, optical, and electrical characteristics of sputtered molybdenum thin films

• Usha Rani,
• Kafi Devi,
• Divya Gupta and
• Sanjeev Aggarwal

Beilstein J. Nanotechnol. 2025, 16, 495–509, doi:10.3762/bjnano.16.38

• the same nominal film thickness after implantation. Keywords: atomic force microscopy; grazing angle X-ray diffractometer; Keithley parametric analyzer; Mo thin films; RF sputtering; spectroscopic ellipsometry; Introduction Molybdenum thin films have garnered significant attention in diverse