Focused ion beam-induced platinum deposition with a low-temperature cesium ion source

• Thomas Henning Loeber,
• Bert Laegel,
• Meltem Sezen,
• Feray Bakan Misirlioglu,
• Edgar J. D. Vredenbregt and
• Yang Li

Beilstein J. Nanotechnol. 2025, 16, 910–920, doi:10.3762/bjnano.16.69

• conditions, but the deposit has lower Pt content for Cs+. The electrical resistivity of the deposit is found to be higher for Cs+ than for Ga+ and decreasing with increasing acceleration voltage. Keywords: cesium ion source; cold atom ion source; focused ion beam (FIB); FIB-induced deposition (FIBID