N-Heterocyclic carbene-based gold etchants

• Robert B. Chevalier,
• Justin Pantano,
• Matthew K. Kiesewetter and
• Jason R. Dwyer

Beilstein J. Nanotechnol. 2023, 14, 865–871, doi:10.3762/bjnano.14.71

• but also the potential for deliberate etching, with the outcome determined by choice of chemically synthesized organic species and solvent. Keywords: gold etchant; microfabrication; N-heterocyclic carbenes; self-assembled monolayer (SAM); thin films; Introduction Self-assembled monolayers (SAMs) are

Label-free highly sensitive probe detection with novel hierarchical SERS substrates fabricated by nanoindentation and chemical reaction methods

• Jingran Zhang,
• Tianqi Jia,
• Yongda Yan,
• Li Wang,
• Peng Miao,
• Yimin Han,
• Xinming Zhang,
• Guangfeng Shi,
• Yanquan Geng,
• Zhankun Weng,
• Daniel Laipple and
• Zuobin Wang

Beilstein J. Nanotechnol. 2019, 10, 2483–2496, doi:10.3762/bjnano.10.239

• etching. For instance, Chen et al. [8] employed an electrochemical etching method to fabricate nanocube structures on a Cu30Mn70 surface by controlling the voltage. In addition, Zhang et al. [10] showed that gold nanoparticles can be fabricated by a gold etchant on a silicon surface as SERS substrates

Fullerenes as adhesive layers for mechanical peeling of metallic, molecular and polymer thin films

• Maria B. Wieland,
• Anna G. Slater,
• Barry Mangham,
• Neil R. Champness and
• Peter H. Beton

Beilstein J. Nanotechnol. 2014, 5, 394–401, doi:10.3762/bjnano.5.46

• potassium iodide solution (see the Experimental section and schematic in Figure 1c), leaving the fullerene layer exposed (C60 is insoluble in gold etchant). The presence of the fullerene was verified by Raman and fluorescence spectroscopy (see the Experimental section). The fullerene layer was then

• from 9 parts 184 silicon elastomer base and 1 part 184 silicon elastomer curing agent (commercially supplied by Dow Corning), applied to the sample, and cured at 150 °C for 15 min. After the mica is removed, the gold is etched using commercial gold etchant (supplied by Sigma Aldrich), an aqueous KI

Fabrication of carbon nanomembranes by helium ion beam lithography

• Xianghui Zhang,
• Henning Vieker,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2014, 5, 188–194, doi:10.3762/bjnano.5.20

• PMMA/CNM/Au layer from the mica substrate was achieved by carefully dipping the sample into water. Subsequently, the Au layer was completely etched by a gold etchant (5 wt % I2 and 10 wt % KI in water). Afterwards, the PMMA/CNM layer was transferred to a Si substrate with an oxide layer with the

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

• Burcin Özdemir,
• Axel Seidenstücker,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2013, 4, 886–894, doi:10.3762/bjnano.4.100

• -growing of the Au NP masks (Supporting Information File 1, Figure S3). Additionally, the residuals of the Au NP masks still present after the last etching step can be removed by using a commonly used gold etchant (Lugol’s solution) [20] without damaging the obtained SiO2 nanopillars. Experimental

Mechanical characterization of carbon nanomembranes from self-assembled monolayers

• Xianghui Zhang,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2011, 2, 826–833, doi:10.3762/bjnano.2.92

• the adhesion between the gold and the mica. The separation of the PMMA/CNM/Au layer from the mica was achieved by careful dipping of the sample into water. Subsequently, the Au layer was completely etched by a gold etchant (5 wt % I2 and 10 wt % KI in water). Afterwards, the CNM/PMMA layer was