Correction: AFM-IR investigation of thin PECVD SiO_x films on a polypropylene substrate in the surface-sensitive mode

• Hendrik Müller,
• Hartmut Stadler,
• Teresa de los Arcos,
• Adrian Keller and
• Guido Grundmeier

Beilstein J. Nanotechnol. 2025, 16, 252–253, doi:10.3762/bjnano.16.19

• /bjnano.16.19 Keywords: AFM-IR; polypropylene; surface-sensitive mode; silicon oxide; thin films; XPS; The authors regret that the acknowledgement in the publication is unfortunately not complete. The following sentence in the Funding section is missing: This work was supported by the German Research

Advanced atomic force microscopy techniques V

• Philipp Rahe,
• Ilko Bald,
• Nadine Hauptmann,
• Regina Hoffmann-Vogel,
• Harry Mönig and
• Michael Reichling

Beilstein J. Nanotechnol. 2025, 16, 54–56, doi:10.3762/bjnano.16.6

• characterize SiOx films as thin as 5 nm by the so-called surface-sensitive mode, in contrast to the established contact mode, which provides much less surface sensitivity. A particular strength for the study of materials is the combination of different measurement modes. Rothe et al. extend the

AFM-IR investigation of thin PECVD SiO_x films on a polypropylene substrate in the surface-sensitive mode

• Hendrik Müller,
• Hartmut Stadler,
• Teresa de los Arcos,
• Adrian Keller and
• Guido Grundmeier

Beilstein J. Nanotechnol. 2024, 15, 603–611, doi:10.3762/bjnano.15.51

• /bjnano.15.51 Abstract Thin silicon oxide films deposited on a polypropylene substrate by plasma-enhanced chemical vapor deposition were investigated using atomic force microscopy-based infrared (AFM-IR) nanospectroscopy in contact and surface-sensitive mode. The focus of this work is the comparison of

• the different measurement methods (i.e., contact mode and surface-sensitive mode) with respect to the chemical surface sensitivity. The use of the surface-sensitive mode in AFM-IR shows an enormous improvement for the analysis of thin films on the IR-active substrate. As a result, in this mode, the

• signal of the substrate material could be significantly reduced. Even layers that are so thin that they could hardly be measured in the contact mode can be analyzed with the surface-sensitive mode. Keywords: AFM-IR; polypropylene; surface-sensitive mode; silicon oxide; thin films; XPS; Introduction

Surface roughness rather than surface chemistry essentially affects insect adhesion

• Matt W. England,
• Tomoya Sato,
• Makoto Yagihashi,
• Atsushi Hozumi,
• Stanislav N. Gorb and
• Elena V. Gorb

Beilstein J. Nanotechnol. 2016, 7, 1471–1479, doi:10.3762/bjnano.7.139

• operated at 50 W and 15 kV with the pass energy of the analyzer at 29.35 eV. The pressure in the analysis chamber was around 6 × 10−9 Pa during all measurements. Core-level signals were obtained at a photoelectron takeoff angle of 15° (surface-sensitive mode) with respect to the sample surface. The binding