Performance optimization of a microwave-coupled plasma-based ultralow-energy ECR ion source for silicon nanostructuring

• Joy Mukherjee,
• Safiul Alam Mollick,
• Tanmoy Basu and
• Tapobrata Som

Beilstein J. Nanotechnol. 2025, 16, 484–494, doi:10.3762/bjnano.16.37

• the transformative impact of nanopatterning through low-energy inert ions. Keywords: optimization of ion current; surface topography; TEM; ultralow-energy ECR-based ion source; UV–vis spectroscopy; Introduction Ion sources serve as fundamental components in numerous scientific and industrial