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1 article(s) from Martinović, Petra

Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions

Hannah Boeckers,
Atul Chaudhary,
Petra Martinović,
Amy V. Walker,
Lisa McElwee-White and
Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

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Figure 1: Molecular structures of (left) tetracarbonyliron(η²-methyl acrylate) (Fe(CO)₄MA) and (right) iron p...

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Figure 2: (a) ESD of neutral species during irradiation with 50 eV electrons from an Fe(CO)₄MA multilayer on ...

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Figure 3: Time evolution of characteristic ESD signals recorded during irradiation with 50 eV electrons of an...

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Figure 4: TDS obtained (a) from a pristine Fe(CO)₄MA multilayer without electron irradiation (denoted as 0 µC...

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Figure 5: (a) AES recorded with an electron energy of 5 keV on a freshly sputtered Ta substrate (bottom). AES...

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Figure 6: AES intensities for Ta_NNN (green), C_KLL (yellow), O_KLL (blue), and Fe_LMM (red) measured as peak-to-...

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Figure 7: AES intensities for Ta_NNN (green), C_KLL (yellow), O_KLL (blue), and Fe_LMM (red) measured as peak-to-...

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Figure 8: AES intensities for Ta_NNN (green), C_KLL (yellow), O_KLL (blue), and Fe_LMM (red) measured as peak-to-...

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Figure 9: Free Gibbs energy for thermal loss of the MA ligand (top) and the CO ligand (bottom) from Fe(CO)₄MA...

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Published 08 May 2024

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Electron-induced deposition using Fe(CO)4MA and Fe(CO)5 – effect of MA ligand and process conditions

Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions