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Beilstein J. Nanotechnol. 2025, 16, 484–494, doi:10.3762/bjnano.16.37
Figure 1: Block diagram of the components of the high-vacuum plasma ion source.
Figure 2: Cross-sectional schematic view of the microwave-coupled ultralow-energy ion beam system.
Figure 3: Variation of beam current with (a–c) gas pressure and (d–f) magnetron power for different ion energ...
Figure 4: Variation of (a–c) beam current with ion extraction voltage at different ion energy; (d) beam curre...
Figure 5: AFM image (2D and 3D) of the evolution of surface morphology after 450 eV Ar-ion bombardment at dif...
Figure 6: Variation of (a–c) surface height modulation of the nanopatterned silicon surface; (d) ripple wavel...
Figure 7: AFM images (2D and 3D) of the evolution of nanostructures on the Si surface with irradiation time a...
Figure 8: (a) UV–vis spectra of pristine and nanopatterned surfaces, (b) variation of rms roughness and refle...
Beilstein J. Nanotechnol. 2024, 15, 350–359, doi:10.3762/bjnano.15.31
Figure 1: AFM height images of (a–d) as-deposited and (e–h) vacuum-annealed WOx films grown at a fixed glanci...
Figure 2: (a) Transmittance plots of the as-deposited NS-WOx films and (b) bandgap variation with film thickn...
Figure 3: (a, c) XPS core-level spectra for W 4f and O 1s, respectively, of a 6 nm as-deposited WOx film. (b,...
Figure 4: (a, b) and (c, d) VCPD maps of, respectively, as-deposited and vacuum annealed WOx films having thi...
Figure 5: XRD spectra of WOx films deposited at 87° before and after annealing. The inset shows the XRD spect...
Figure 6: I–V characteristics of (a) as-deposited and (b) annealed WOx/p-Si heterostructures for different WOx...