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Beilstein J. Nanotechnol. 2024, 15, 1030–1040, doi:10.3762/bjnano.15.84
Figure 1: Fabrication process of the pixel-based CNT microbolometer. (a) AlOx deposition, (b) lithography pro...
Figure 2: (a) Scanning electron microscopy image and (b) 3D close-up of the pixel-based CNT microbolometer.
Figure 3: (a) TEM image showing DWCNTs and (b) Raman spectrum of the VACNTs.
Figure 4: Schematic of the device under test (DUT) and measurement setups to characterize the CNT-based micro...
Figure 5: Temperature-dependent I–V curves (a) for sample 1 with contact pads and (b) for sample 2 using gold...
Figure 6: Resistance–temperature relationship (a) for sample 1 with contact pads and (b) for sample 2 using g...
Figure 7: Response measurements for sample 1 using metal contact pads at (a) 90 Hz and (b) 1100 Hz (with an a...
Figure 8: Response measurements for sample 2 using gold whisker contacts at (a) 90 Hz and (b) 1100 Hz (with a...
Beilstein J. Nanotechnol. 2014, 5, 1575–1579, doi:10.3762/bjnano.5.169
Figure 1: General scheme for the fabrication of spatially deposited CNT islands. (a) A photoresist is lithogr...
Figure 2: SEM images of neurons cultured on randomly oriented CNT islands. Panel a) depicts a single CNT isla...
Figure 3: Growth of cortical neurons cultured on islands of vertically aligned CNT architectures. a) Formatio...
Figure 4: Development of the number of neurons in the interspace regions of the spatially oriented CNTs.
Figure 5: SEM images of a) typical size and arrangement of CNT pillars to be obtained by a WACVD process b) F...