Orientation-dependent photonic bandgaps in gold-dust weevil scales and their titania bioreplicates

• Norma Salvadores Farran,
• Limin Wang,
• Primoz Pirih and
• Bodo D. Wilts

Beilstein J. Nanotechnol. 2025, 16, 1–10, doi:10.3762/bjnano.16.1

• copolymers [10][11], lithography, or laser etching [12][13], but it can be routinely found in animal integuments. Biomimetic approaches using templates from natural structures offers a possible alternative. The scales of many beetles and weevils contain diamond photonic crystals [14][15][16] that may serve

Fabrication of hafnium-based nanoparticles and nanostructures using picosecond laser ablation

• Abhishek Das,
• Mangababu Akkanaboina,
• Jagannath Rathod,
• R. Sai Prasad Goud,
• Kanaka Ravi Kumar,
• Raghu C. Reddy,
• Ratheesh Ravendran,
• Katia Vutova,
• S. V. S. Nageswara Rao and
• Venugopal Rao Soma

Beilstein J. Nanotechnol. 2024, 15, 1639–1653, doi:10.3762/bjnano.15.129

• desired morphology is essential for a given application. Generally, practical techniques for obtaining nanomaterials are sol–gel method, chemical and physical vapour deposition, hydrothermal method, ball milling, grinding, lithography, etching, and laser ablation [14][15][16][17][18]. The morphology

Green synthesis of silver nanoparticles derived from algae and their larvicidal properties to control Aedes aegypti

• Matheus Alves Siqueira de Assunção,
• Douglas Dourado,
• Daiane Rodrigues dos Santos,
• Gabriel Bezerra Faierstein,
• Mara Elga Medeiros Braga,
• Severino Alves Junior,
• Rosângela Maria Rodrigues Barbosa,
• Herminio José Cipriano de Sousa and
• Fábio Rocha Formiga

Beilstein J. Nanotechnol. 2024, 15, 1566–1575, doi:10.3762/bjnano.15.123

• electrical, optical, and magnetic properties for a wide range of applications [22][23]. They can be synthesized by different procedures based on “top-down” or “bottom-up” approaches [24] (Figure 1). Top-down synthesized silver nanoparticles can be obtained by lithography, attrition, milling, and other

• residues in the environment [30]. Physical methods include laser ablation, UV irradiation, evaporation condensation, aerosol methods, and lithography. High cost, high energy consumption, and expensive equipment make these techniques uneconomical [31]. Because of these disadvantages, synthesis methods based

Ion-induced surface reactions and deposition from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

• Mohammed K. Abdel-Rahman,
• Patrick M. Eckhert,
• Atul Chaudhary,
• Johnathon M. Johnson,
• Jo-Chi Yu,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2024, 15, 1427–1439, doi:10.3762/bjnano.15.115

• techniques, they do not require the use of organic solvents present in traditional lithography. Indeed, FEBID/FIBID can be considered as alternatives to commonly used methods such as chemical vapor deposition (CVD) and atomic layer deposition (ALD), particularly for area-selective, as opposed to conformal

Out-of-plane polarization induces a picosecond photoresponse in rhombohedral stacked bilayer WSe₂

• Guixian Liu,
• Yufan Wang,
• Zhoujuan Xu,
• Zhouxiaosong Zeng,
• Lanyu Huang,
• Cuihuan Ge and
• Xiao Wang

Beilstein J. Nanotechnol. 2024, 15, 1362–1368, doi:10.3762/bjnano.15.109

• monolayers of WSe2 were aligned at a 0° angle to form the 3R phase. The graphene/3R WSe2/graphene heterojunctions were aligned and assembled onto a SiO2/Si substrate by the all-dry transfer method. Au/Cr (50/10 nm) electrodes were patterned using standard electron-beam lithography (EBL, Raith 150 Two) and

Investigation of Hf/Ti bilayers for the development of transition-edge sensor microcalorimeters

• Victoria Y. Safonova,
• Anna V. Gordeeva,
• Anton V. Blagodatkin,
• Dmitry A. Pimanov,
• Anton A. Yablokov and
• Andrey L. Pankratov

Beilstein J. Nanotechnol. 2024, 15, 1353–1361, doi:10.3762/bjnano.15.108

• different geometries were investigated in a continuation of [10], in which thin films of both pure hafnium and hafnium in combination with normal metals were considered. It is expected that an additional processing operation (lithography and lift-off process) to form the bridges may degrade their properties

• , photolithography was performed on a Karl Suss MJB3 lithography aligner before deposition. We used AZ5214E photoresist, which was subsequently developed with MIF726. We then deposited 85 nm of hafnium and 5 nm of titanium onto the substrates through developed areas in the resist, using an electron beam evaporator

Effect of wavelength and liquid on formation of Ag, Au, Ag/Au nanoparticles via picosecond laser ablation and SERS-based detection of DMMP

• Sree Satya Bharati Moram,
• Chandu Byram and
• Venugopal Rao Soma

Beilstein J. Nanotechnol. 2024, 15, 1054–1069, doi:10.3762/bjnano.15.86

• detection of DMMP (1.2 ppm V) in the vapor phase using Glass_Ag_Au NPs, 3D fractal microstructure substrates developed by corner lithography and anisotropic wet etching of silicon using the 785 nm as the Raman excitation. When UV excitation was utilized during the measurements, the Raman peak intensities

Bolometric IR photoresponse based on a 3D micro-nano integrated CNT architecture

• Yasameen Al-Mafrachi,
• Sandeep Yadav,
• Sascha Preu,
• Jörg J. Schneider and
• Oktay Yilmazoglu

Beilstein J. Nanotechnol. 2024, 15, 1030–1040, doi:10.3762/bjnano.15.84

• -density, mainly double-walled CNTs with simple lateral external contacts to the surroundings. Standard optical lithography techniques were used to locally tailor the width of the vertical block structure. The complete sensor system, based on a broadband blackbody absorber region and a high-resistance

• stability and reliable operation at elevated temperatures in excess of 200 °C, extending its potential utility in challenging environmental conditions. This design allows for further device miniaturization using optical lithography techniques. Its unique properties for mass production through large-scale

• was deposited by atomic layer deposition to support the elongated growth of CNTs (Figure 1a). The contact pad regions were opened by an optical lithography process prior to the evaporation of Cr/Au (20 nm, e-beam/100 nm, thermal) (Figure 1b). The overall M-shape for the CNT growth as shown in Figure

Recent progress on field-effect transistor-based biosensors: device perspective

• Billel Smaani,
• Fares Nafa,
• Mohamed Salah Benlatrech,
• Ismahan Mahdi,
• Hamza Akroum,
• Mohamed walid Azizi,
• Khaled Harrar and
• Sayan Kanungo

Beilstein J. Nanotechnol. 2024, 15, 977–994, doi:10.3762/bjnano.15.80

• -care diagnostic systems. This device was realized using a top-to-down approach with an anisotropic and cost-effective self-stop etching method [85][86]. A novel CMOS anisotropic technique was implemented for the etching process, combining classical optical and electron beam lithography with anisotropic

• CMOS technology, combined with optical lithography and an anisotropic self-stop etching method [88][89]. The incorporated P- and N-type NWs showed complementary electrical responses upon prostate-specific antigen binding, providing a unique means of internal command for biosensing signal verification

• -end biosensing parts are made using gold electrode material and manufactured by a lithography process, liftoff technique, and metal evaporation process. It has been indicated that the proposed EG FET-based biosensors exhibit super selectivity and high sensitivity for a reliable detection of uric acid

Beyond biomimicry – next generation applications of bioinspired adhesives from microfluidics to composites

• Dan Sameoto

Beilstein J. Nanotechnol. 2024, 15, 965–976, doi:10.3762/bjnano.15.79

• lithography; Perspective As of the time of this writing, it has been 24 years since the seminal work by Kellar Autumn and his colleagues demonstrated how a single gecko foot hair could generate adhesion [1]. Autumn’s discovery that van der Waals forces were the primary mechanism behind the extraordinary

• draws inspiration from nature, as it is quite common for many animals to include multiple adhesion mechanisms. Between multimaterial 3D printing and the use of newer techniques to precisely define micro/nanofeatures [34] that are beyond the capabilities of traditional lithography, there is a good deal

Water-assisted purification during electron beam-induced deposition of platinum and gold

• Cristiano Glessi,
• Fabian A. Polman and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 884–896, doi:10.3762/bjnano.15.73

• orientation) with a native silicon oxide layer. Samples of 1 × 1 cm2 were used, on to which an array of annular patterns was lithographically defined, by laser lithography and etching using an SF6–O2 dry-etch, to facilitate location of the deposition areas. The substrates were roughly cleaned in acetone and

Elastic modulus of β-Ga₂O₃ nanowires measured by resonance and three-point bending techniques

• Annamarija Trausa,
• Sven Oras,
• Sergei Vlassov,
• Mikk Antsov,
• Tauno Tiirats,
• Andreas Kyritsakis,
• Boris Polyakov and
• Edgars Butanovs

Beilstein J. Nanotechnol. 2024, 15, 704–712, doi:10.3762/bjnano.15.58

• photoresist on the wafer using conventional optical lithography. Next, the SiO2 was selectively removed using a buffered HF solution to replicate the resist pattern in the oxide layer. Then, the silicon was etched at 90 °C in a tetramethylammonium hydroxide (TMAH) solution to create etch pits. Finally, the

Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• etching the deposit from below, resulting in under-etched structures. The evolution of the sidewall angle during etching has also been experimentally observed in a scanning electron microscope by continuously monitoring the secondary electron detector signal. Keywords: electron lithography; FEBID; FEBIE

• using focused ion beam (FIB) milling and shown as an electron tilt image in Figure 1b, clearly demonstrates the Gaussian shape. For lithography applications, however, both the long tails and the Gaussian cross section are highly undesirable. The tails may form interconnects to neighboring lines, and the

• which the sidewall angle becomes 90°. The method described here to make vertical sidewalls of FEBID deposits has the potential to make FEBIP a more competitive technology for lithography applications. Experimental The FEBID and FEBIE experiments were carried out in a Thermo Fisher Scientific Helios 650

Heat-induced morphological changes in silver nanowires deposited on a patterned silicon substrate

• Elyad Damerchi,
• Sven Oras,
• Edgars Butanovs,
• Allar Liivlaid,
• Mikk Antsov,
• Boris Polyakov,
• Annamarija Trausa,
• Veronika Zadin,
• Andreas Kyritsakis,
• Loïc Vidal,
• Karine Mougin,
• Siim Pikker and
• Sergei Vlassov

Beilstein J. Nanotechnol. 2024, 15, 435–446, doi:10.3762/bjnano.15.39

• silicon substrates with square holes were prepared from (100) silicon wafers (Semiconductor Wafer, Inc.) with 50 nm thermal oxide in four steps as follows: 1) conventional optical lithography process to produce the desired pattern in a photoresist on the wafer; 2) selective removal of SiO2 using buffered

On the mechanism of piezoresistance in nanocrystalline graphite

• Sandeep Kumar,
• Simone Dehm and
• Ralph Krupke

Beilstein J. Nanotechnol. 2024, 15, 376–384, doi:10.3762/bjnano.15.34

• in the structure shown in Figure 1b using e-beam lithography. There were no metal films deposited on NCG, and the electrical contact was made between gold spring contacts and NCG directly. For Raman measurements, S1805 (1:10 dilution with PGMEA) was spin-coated on both sides of the flexible glass

Design, fabrication, and characterization of kinetic-inductive force sensors for scanning probe applications

• August K. Roos,
• Ermes Scarano,
• Elisabet K. Arvidsson,
• Erik Holmgren and
• David B. Haviland

Beilstein J. Nanotechnol. 2024, 15, 242–255, doi:10.3762/bjnano.15.23

• -beam lithography and reactive-ion etching. We simulate the electromagnetic response of the meandering nanowire inductors using Sonnet, a quasi-3D electromagnetic simulator [32], which has the feature of including sheet kinetic inductance Lk,□. We begin by simulating the meandering inductor itself to

• -ion etch (RIE) process in a Plasmapro 100 ICP300 from Oxford Instruments, with an etch rate of roughly 8 nm/min. (e) Fine circuit pattern. Electron-beam lithography defines the finer structures, such as the meandering nanowire inductor, the shunt inductor, and the interdigital gap of the capacitor. We

• etch under the triangular silicon nitride plate and form a very straight clamping line to the Si substrate. However, the KOH etch is slow compared to the isotropic RIE process and attacks the Nb-Ti-N superconducting film. An additional lithography step was needed to protect the superconducting circuit

Ion beam processing of DNA origami nanostructures

• Leo Sala,
• Agnes Zerolová,
• Violaine Vizcaino,
• Alain Mery,
• Alicja Domaracka,
• Hermann Rothard,
• Philippe Boduch,
• Dominik Pinkas and
• Jaroslav Kocišek

Beilstein J. Nanotechnol. 2024, 15, 207–214, doi:10.3762/bjnano.15.20

• by ion beams, modeling ion implantation, lithography, and sputtering conditions. Structural changes in 2D DNA origami nanostructures deposited on Si are analyzed using AFM imaging. The observed effects on DNA origami include structure height decrease or increase upon fast heavy ion irradiation in

• in the present context are works on the use of DNA origami nanostructures in top-down or bottom-up nanopatterning approaches [7][8][9][10]. So far, DNA origami has been proposed only as a resist or as a platform to precisely arrange nanostructure precursors in lithography [11][12][13]. Incorporating

• origami but also their transformation upon irradiation. FIB processing Inspired by the shape preservation of DNA origami nanostructures under ion beam irradiation, we explored the damage response under a conventional focused ion beam typically used in lithography. Lines of about ∼140 nm in width ∼40 nm in

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates

• Aleksandra Szkudlarek,
• Jan M. Michalik,
• Inés Serrano-Esparza,
• Zdeněk Nováček,
• Veronika Novotná,
• Piotr Ozga,
• Czesław Kapusta and
• José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

• extraordinary mechanical and electronic properties. Although many years have passed since its discovery, manipulating single graphene layers is still challenging using standard resist-based lithography techniques. Recently, it has been shown that it is possible to etch graphene directly in water-assisted

• : direct writing; dwell time; electron dose; etching; graphene; maskless lithography; nanopatterning; Introduction The discovery of extraordinary and controllable electrical conductivity in graphene back in 2004 made it the most recognized 2D material [1]. The newly discovered phenomena, such as

• communication devices. All those future technologies will require high-precision lithography techniques with excellent lateral resolution, high throughput, and minimized possibility of material damage. In the last decade, several approaches have been made to provide the most suitable method for patterning

Measurements of dichroic bow-tie antenna arrays with integrated cold-electron bolometers using YBCO oscillators

• Leonid S. Revin,
• Dmitry A. Pimanov,
• Alexander V. Chiginev,
• Anton V. Blagodatkin,
• Viktor O. Zbrozhek,
• Andrey V. Samartsev,
• Anastasia N. Orlova,
• Dmitry V. Masterov,
• Alexey E. Parafin,
• Victoria Yu. Safonova,
• Anna V. Gordeeva,
• Andrey L. Pankratov,
• Leonid S. Kuzmin,
• Anatolie S. Sidorenko,
• Silvia Masi and
• Paolo de Bernardis

Beilstein J. Nanotechnol. 2024, 15, 26–36, doi:10.3762/bjnano.15.3

• for the 240 GHz channel is 34.8 GHz, and the maximum absorption occurs at a frequency of 239.6 GHz. Fabrication of samples of receiving systems with CEBs The samples and the sample blanks with electronic lithography, ready for electron beam evaporation, were fabricated at the Chalmers University of

• Microstructures of the Russian Academy of Sciences (IPM RAS), with subsequent measurements of the samples in the sorption 3He refrigerator of our laboratory. The 210/240 GHz receiving system is fabricated using a two-layer technology (two lithography steps). During the first photolithography step, a layer of

• contact pads, DC lines, and antennas is made. The second electronic lithography step is used for the exposition of the bolometric layer. During photolithography, the first exposure was carried out with two photoresists. This is because the DC linewidth was 3 µm, and the use of a single photoresist would

TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

• Joshua Williams,
• Michael I. Faley,
• Joseph Vimal Vas,
• Peng-Han Lu and
• Rafal E. Dunin-Borkowski

Beilstein J. Nanotechnol. 2024, 15, 1–12, doi:10.3762/bjnano.15.1

• using three different fabrication methods: lift-off, ion beam etching (IBE), and stencil lithography. They were further analyzed using different instruments, including scanning electron microscopy, LTEM, and electron holography. A bilayer of positive PMMA resist was utilized in the first fabrication

• information down to the nanometer/atomic scale. However, the corresponding samples need to be prepared on electron-beam-transparent membranes, which are very fragile and can easily break during standard lithography procedures. Although a lift-off approach has been demonstrated [20], alternative methods may be

• . Fences and edge roughness from the imperfect lift-off process were reported to influence the magnetic properties of nanostructures [22]. The third method, stencil lithography, makes use of a shadow mask, which was fabricated by milling submicrometer apertures on a conventional TEM grid using a focused

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

• Lester Uy Vinzons,
• Guo-Chung Dong and
• Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

• approaches are quite limited. In this work, we show that nanopillars and nanoholes, and their combination with microgrooves, can be patterned on polyurethane (PU) films using a low-cost, reusable photoresist master mold prepared via nanosphere lens lithography and UV-LED photolithography, with specific

• fabrication. For instance, traditional techniques, such as electron-beam lithography, laser writing, and cleanroom photolithography, have flexibility in design but require costly equipment [13][14]. Relatively cheaper techniques, such as anodization, electroplating, and electrospinning, are limited by the

• ]. Therefore, there is still a need to develop simple and cost-effective fabrication methods applicable to a wide range of nano- and micropatterns and biomaterials. In our previous studies, we have shown how nanosphere lens lithography (NLL) can be used with a low-cost ultraviolet light-emitting diode (UV-LED

Industrial perspectives for personalized microneedles

• Remmi Danae Baker-Sediako,
• Benjamin Richter,
• Matthias Blaicher,
• Michael Thiel and
• Martin Hermatschweiler

Beilstein J. Nanotechnol. 2023, 14, 857–864, doi:10.3762/bjnano.14.70

• microoptic fabrication, grayscale lithography offers a solution to mitigate the staircase effect. Grayscale lithography is a novel approach in photolithography for 2.5D patterning (x,y,z) with ultrasmooth surfaces that exhibits improved shape accuracy [57][58]. In 2019, Nanoscribe GmbH & Co launched the

• Quantum X platform that commercialized maskless grayscale lithography for microoptics made via 2PP, a process called “Two-Photon Grayscale Lithography” (2GL®) [59][60]. 2GL® differs from traditional 2PP and 1PP lithography because the laser or exposure dosage in individual voxels is controlled in three

• on a “Quantum X shape” lithography system (Nanoscribe GmbH & Co, Karlsruhe, Germany) following printing and post-printing protocols from NanoGuide. Post-printing protocols begin by removing unpolymerized material via two-step washing with either propylene glycol methyl ether acetate or mr-Dev for 15

Silver-based SERS substrates fabricated using a 3D printed microfluidic device

• Phommachith Sonexai,
• Minh Van Nguyen,
• Bui The Huy and
• Yong-Ill Lee

Beilstein J. Nanotechnol. 2023, 14, 793–803, doi:10.3762/bjnano.14.65

• separate microreactor [12][22]. A traditional approach to producing microfluidic devices involves a three-step microfabrication process of (i) creating a channel mold using photolithography, (ii) fabricating the channels by casting the mold through soft lithography, and (iii) bonding the channel device to

Observation of multiple bulk bound states in the continuum modes in a photonic crystal cavity

• Rui Chen,
• Yi Zheng,
• Xingyu Huang,
• Qiaoling Lin,
• Chaochao Ye,
• Meng Xiong,
• Martijn Wubs,
• Yungui Ma,
• Minhao Pu and
• Sanshui Xiao

Beilstein J. Nanotechnol. 2023, 14, 544–551, doi:10.3762/bjnano.14.45

• To verify the multiple modes in the bandgap mirror-assisted BIC cavity, several samples with different sidelengths (w) were fabricated by electron beam lithography (EBL) and inductively coupled plasma (ICP) etching on 500 nm thick AlGaAs on a sapphire wafer. The parameter sweep of w around 400 nm was